Impact of model-based fracturing on e-beam proximity effect correction methodology

2010 ◽  
Author(s):  
Christophe Pierrat ◽  
Ingo Bork
Keyword(s):  
Proximity Effect ◽  
Model Based ◽  
Proximity Effect Correction

Model-based proximity effect correction for electron-beam direct-write lithography

2010 ◽  
Author(s):  
Chun-Hung Liu ◽  
Pei-Lin Tien ◽  
Philip C. W. Ng ◽  
Yu-Tian Shen ◽  
Kuen-Yu Tsai
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Direct Write ◽  
Model Based ◽  
Proximity Effect Correction

Fabrication of Si photonic waveguides by electron beam lithography using improved proximity effect correction

2020 ◽  
Vol 59 (12) ◽  
pp. 126502
Author(s):  
Moataz Eissa ◽  
Takuya Mitarai ◽  
Tomohiro Amemiya ◽  
Yasuyuki Miyamoto ◽  
Nobuhiko Nishiyama
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
Photonic Waveguides ◽  
Proximity Effect Correction

Proximity effect correction for reticle fabrication

2000 ◽  
Author(s):  
Masao Sugiyama ◽  
Shinji Kubo ◽  
Koji Hiruta ◽  
Takayuki Iwamatsu ◽  
Tatsuya Fujisawa ◽  
...  
Keyword(s):  
Proximity Effect ◽  
Proximity Effect Correction

Proximity effect correction by the GHOST method using a scattering stencil mask

1999 ◽  
Vol 17 (6) ◽  
pp. 2860 ◽  
Author(s):  
Hiroshi Yamashita ◽  
Eiichi Nomura ◽  
Shoko Manako ◽  
Hideo Kobinata ◽  
Ken Nakajima ◽  
...  
Keyword(s):  
Proximity Effect ◽  
Stencil Mask ◽  
Proximity Effect Correction
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