Determination of resist exposure parameters in helium ion beam lithography: Absorbed energy gradient, contrast, and critical dose
2000 ◽
Vol 18
(6)
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pp. 3177
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Keyword(s):
Ion Beam
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2021 ◽
Vol 31
(5)
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pp. 1-4
2018 ◽
Vol 193
◽
pp. 18-22
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2016 ◽
Vol 155
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pp. 74-78
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