Ultrasensitive colocalization detection based on plasmonic nanolithography with molecular-overlapped optical near-fields

2018 ◽  
Author(s):  
Hongki Lee ◽  
Donghyun Kim ◽  
Youngjin Oh ◽  
Taehwang Son ◽  
Kiheung Kim ◽  
...  
Keyword(s):  
Plasmonic Nanolithography

Application of Solid Immersion Lens-Based Near-Field Recording Technology to High-Speed Plasmonic Nanolithography

2012 ◽  
Vol 51 (8S2) ◽  
pp. 08JF01 ◽  
Author(s):  
Kyoung-Su Park ◽  
Taeseob Kim ◽  
Won-Sup Lee ◽  
Hang-Eun Joe ◽  
Byung-Kwon Min ◽  
...  
Keyword(s):  
High Speed ◽  
Near Field ◽  
Solid Immersion Lens ◽  
Recording Technology ◽  
Field Recording ◽  
Plasmonic Nanolithography

Application of Solid Immersion Lens-Based Near-Field Recording Technology to High-Speed Plasmonic Nanolithography

2012 ◽  
Vol 51 ◽  
pp. 08JF01 ◽  
Author(s):  
Kyoung-Su Park ◽  
Taeseob Kim ◽  
Won-Sup Lee ◽  
Hang-Eun Joe ◽  
Byung-Kwon Min ◽  
...  
Keyword(s):  
High Speed ◽  
Near Field ◽  
Solid Immersion Lens ◽  
Recording Technology ◽  
Field Recording ◽  
Plasmonic Nanolithography

Plasmonic Nanofocusing in Deep and Extreme Sub-Wavelength Scale for Scalable Nanolithography

2017 ◽  
Author(s):  
Zhidong Du ◽  
Chen Chen ◽  
Liang Pan
Keyword(s):  
High Speed ◽  
Low Cost ◽  
Optical Power ◽  
Cost Effective ◽  
Cost Effective Approach ◽  
Wavelength Scale ◽  
Plasmonic Nanofocusing ◽  
Nanoscale Metrology ◽  
Next Generation Lithography ◽  
Plasmonic Nanolithography

Maskless nanolithography is an agile and cost effective approach if their throughputs can be scaled for mass production purposes. Using plasmonic nanolithography approach, direct pattern writing was successfully demonstrated with 22 nm half-pitch at high speed. Plasmonic nanolithography uses an array of plasmonic lenses to directly pattern features on a rotating substrate. Taking the advantage of air bearing surface techniques, the system can expose the wafer pixel by pixel with a speed of ∼10 m/s, much faster than any conventional scanning based lithography system. It is a low-cost, high-throughput maskless approach for the next generation lithography and also for the emerging nanotechnology applications, such as nanoscale metrology and imaging. A critical part of the PNL is to use plasmonic lens to deliver highly concentrated optical power at nanoscale. We have demonstrated such nanoscale process and achieved 22 nm resolution. Here, we report our recent efforts of designing new plasmonic nanofocusing structures that is capable of achieving optical confinement below 20 nm which can potentially support direct patterning at sub-10nm resolution.

Plasmonic Nanolithography: A Review

Plasmonics ◽  
2011 ◽  
Vol 6 (3) ◽  
pp. 565-580 ◽  
Author(s):  
Zhihua Xie ◽  
Weixing Yu ◽  
Taisheng Wang ◽  
Hongxin Zhang ◽  
Yongqi Fu ◽  
...  
Keyword(s):  
Plasmonic Nanolithography

Plasmonic Nanolithography

Nano Letters ◽  
2004 ◽  
Vol 4 (6) ◽  
pp. 1085-1088 ◽  
Author(s):  
Werayut Srituravanich ◽  
Nicholas Fang ◽  
Cheng Sun ◽  
Qi Luo ◽  
Xiang Zhang
Keyword(s):  
Plasmonic Nanolithography

Recent Advances in Plasmonic Nanolithography

2018 ◽  
Vol 10 (1) ◽  
pp. 1-12 ◽  
Author(s):  
Ying Luo ◽  
Xiaoxiao Jiang ◽  
Lin Liu ◽  
Guangyuan Si
Keyword(s):  
Recent Advances ◽  
Plasmonic Nanolithography

High-speed plasmonic nanolithography with a solid immersion lens-based plasmonic optical head

2012 ◽  
Vol 101 (16) ◽  
pp. 161109 ◽  
Author(s):  
Taeseob Kim ◽  
Won-Sup Lee ◽  
Hang-Eun Joe ◽  
Geon Lim ◽  
Guk-Jong Choi ◽  
...  
Keyword(s):  
High Speed ◽  
Solid Immersion Lens ◽  
Optical Head ◽  
Plasmonic Nanolithography
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