High-speed plasmonic nanolithography with a solid immersion lens-based plasmonic optical head

2012 ◽  
Vol 101 (16) ◽  
pp. 161109 ◽  
Author(s):  
Taeseob Kim ◽  
Won-Sup Lee ◽  
Hang-Eun Joe ◽  
Geon Lim ◽  
Guk-Jong Choi ◽  
...  
Keyword(s):  
High Speed ◽  
Solid Immersion Lens ◽  
Optical Head ◽  
Plasmonic Nanolithography

Application of Solid Immersion Lens-Based Near-Field Recording Technology to High-Speed Plasmonic Nanolithography

2012 ◽  
Vol 51 (8S2) ◽  
pp. 08JF01 ◽  
Author(s):  
Kyoung-Su Park ◽  
Taeseob Kim ◽  
Won-Sup Lee ◽  
Hang-Eun Joe ◽  
Byung-Kwon Min ◽  
...  
Keyword(s):  
High Speed ◽  
Near Field ◽  
Solid Immersion Lens ◽  
Recording Technology ◽  
Field Recording ◽  
Plasmonic Nanolithography

Application of Solid Immersion Lens-Based Near-Field Recording Technology to High-Speed Plasmonic Nanolithography

2012 ◽  
Vol 51 ◽  
pp. 08JF01 ◽  
Author(s):  
Kyoung-Su Park ◽  
Taeseob Kim ◽  
Won-Sup Lee ◽  
Hang-Eun Joe ◽  
Byung-Kwon Min ◽  
...  
Keyword(s):  
High Speed ◽  
Near Field ◽  
Solid Immersion Lens ◽  
Recording Technology ◽  
Field Recording ◽  
Plasmonic Nanolithography

High-Speed Gap Servo Control for Solid-Immersion-Lens-Based Near-Field Recording System with a Flexible Optical Disk

2011 ◽  
Vol 50 (9S1) ◽  
pp. 09MC04 ◽  
Author(s):  
Hyunwoo Hwang ◽  
Jung-Gon Kim ◽  
Ki Wook Song ◽  
Kyoung-Su Park ◽  
No-cheol Park ◽  
...  
Keyword(s):  
High Speed ◽  
Near Field ◽  
Optical Disk ◽  
Recording System ◽  
Servo Control ◽  
Solid Immersion Lens ◽  
Field Recording

Blue-violet 2-beam Optical Head for High-speed Recording

2003 ◽  
Author(s):  
K. Sasaki ◽  
D. Koide ◽  
H. Yanagisawa ◽  
H. Tokumaru ◽  
Y. Fujita
Keyword(s):  
High Speed ◽  
Optical Head

High Speed Accessing using Split Optical Head

1989 ◽  
Author(s):  
K. Koumura ◽  
F. Takizawa ◽  
T. Iwanaga ◽  
H. Inada ◽  
Y. Yamanaka ◽  
...  
Keyword(s):  
High Speed ◽  
Optical Head

High-Speed Gap Servo Control for Solid-Immersion-Lens-Based Near-Field Recording System with a Flexible Optical Disk

2011 ◽  
Vol 50 (9) ◽  
pp. 09MC04 ◽  
Author(s):  
Hyunwoo Hwang ◽  
Jung-Gon Kim ◽  
Ki Wook Song ◽  
Kyoung-Su Park ◽  
No-cheol Park ◽  
...  
Keyword(s):  
High Speed ◽  
Near Field ◽  
Optical Disk ◽  
Recording System ◽  
Servo Control ◽  
Solid Immersion Lens ◽  
Field Recording

Effect of Air Bearing Surface on Shock Resistance of Optical Head for Solid Immersion Lens Based Near Field Recording System

2009 ◽  
Vol 45 (5) ◽  
pp. 2236-2239 ◽  
Author(s):  
Yonghyun Lee ◽  
Yong-Eun Lee ◽  
Ki-Hoon Kim ◽  
Seokhwan Kim ◽  
Hyunseok Yang ◽  
...  
Keyword(s):  
Near Field ◽  
Recording System ◽  
Air Bearing ◽  
Solid Immersion Lens ◽  
Bearing Surface ◽  
Optical Head ◽  
Field Recording ◽  
Shock Resistance

Plasmonic Nanofocusing in Deep and Extreme Sub-Wavelength Scale for Scalable Nanolithography

2017 ◽  
Author(s):  
Zhidong Du ◽  
Chen Chen ◽  
Liang Pan
Keyword(s):  
High Speed ◽  
Low Cost ◽  
Optical Power ◽  
Cost Effective ◽  
Cost Effective Approach ◽  
Wavelength Scale ◽  
Plasmonic Nanofocusing ◽  
Nanoscale Metrology ◽  
Next Generation Lithography ◽  
Plasmonic Nanolithography

Maskless nanolithography is an agile and cost effective approach if their throughputs can be scaled for mass production purposes. Using plasmonic nanolithography approach, direct pattern writing was successfully demonstrated with 22 nm half-pitch at high speed. Plasmonic nanolithography uses an array of plasmonic lenses to directly pattern features on a rotating substrate. Taking the advantage of air bearing surface techniques, the system can expose the wafer pixel by pixel with a speed of ∼10 m/s, much faster than any conventional scanning based lithography system. It is a low-cost, high-throughput maskless approach for the next generation lithography and also for the emerging nanotechnology applications, such as nanoscale metrology and imaging. A critical part of the PNL is to use plasmonic lens to deliver highly concentrated optical power at nanoscale. We have demonstrated such nanoscale process and achieved 22 nm resolution. Here, we report our recent efforts of designing new plasmonic nanofocusing structures that is capable of achieving optical confinement below 20 nm which can potentially support direct patterning at sub-10nm resolution.

Improved Nanogap Servo System Using an Error-Based Disturbance Observer for High-Speed in Solid Immersion Lens-Based Plasmonic Lithography

2013 ◽  
Vol 52 (9S2) ◽  
pp. 09LG02 ◽  
Author(s):  
Geon Lim ◽  
Taeseob Kim ◽  
Won-Sup Lee ◽  
Guk-Jong Choi ◽  
Kyoung-Su Park ◽  
...  
Keyword(s):  
Disturbance Observer ◽  
High Speed ◽  
Servo System ◽  
Solid Immersion Lens
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