Photoresist line-edge roughness analysis using scaling concepts

2004 ◽  
Vol 3 (3) ◽  
pp. 429 ◽  
Author(s):  
Vassilios Constantoudis
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness ◽  
Roughness Analysis

Photoresist line-edge roughness analysis using scaling concepts

2003 ◽  
Author(s):  
Vasilios Constantoudis ◽  
George P. Patsis ◽  
Evangelos Gogolides
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness ◽  
Roughness Analysis

Three-dimensional profile extraction from CD-SEM image and top/bottom CD measurement by line-edge roughness analysis

2013 ◽  
Author(s):  
Atsuko Yamaguchi ◽  
Takeyoshi Ohashi ◽  
Takahiro Kawasaki ◽  
Osamu Inoue ◽  
Hiroki Kawada
Keyword(s):  
Three Dimensional ◽  
Line Edge Roughness ◽  
Sem Image ◽  
Edge Roughness ◽  
Roughness Analysis

Line Edge Roughness Analysis for KrF Photoresists under sub 0.11 um Groundrules

2019 ◽  
Vol 18 (1) ◽  
pp. 321-332
Author(s):  
Lei Wang ◽  
Liang Ji ◽  
Peng Wu ◽  
Huan Kan ◽  
Weimin He ◽  
...  
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness ◽  
Roughness Analysis

scholarly journals Optimization of Nano-Grating Pitch Evaluation Method Based on Line Edge Roughness Analysis

2017 ◽  
Vol 17 (6) ◽  
pp. 264-268 ◽  
Author(s):  
Jie Chen ◽  
Jie Liu ◽  
Xingrui Wang ◽  
Longfei Zhang ◽  
Xiao Deng ◽  
...  
Keyword(s):  
Evaluation Method ◽  
Line Edge Roughness ◽  
Zero Crossing ◽  
Edge Roughness ◽  
Roughness Analysis ◽  
On Line ◽  
Two Parameters ◽  
Atom Lithography ◽  
Positive Relevance

Abstract Pitch uncertainty and line edge roughness are among the critical quality attributes of a pitch standard and normally the analyses of these two parameters are separate. The analysis of self-traceable Cr atom lithography nano-gratings shows a positive relevance and sensitivity between LER and evaluated standard deviation of pitch. Therefore, LER can be used as an aided pre-evaluation parameter for the pitch calculation method, such as the gravity center method or the zero-crossing points method. The optimization of the nano-grating evaluation method helps to obtain the accurate pitch value with fewer measurements and provide a comprehensive characterization of pitch standards.

Characterization of Line-Edge Roughness in Cu/Low-kInterconnect Pattern

2008 ◽  
Vol 47 (4) ◽  
pp. 2501-2505 ◽  
Author(s):  
Atsuko Yamaguchi ◽  
Daisuke Ryuzaki ◽  
Ken-ichi Takeda ◽  
Jiro Yamamoto ◽  
Hiroki Kawada ◽  
...  
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness
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