Influence of post exposure bake time on EUV photoresist RLS trade-off

2017 ◽  
Author(s):  
Yannick Vesters ◽  
Danilo De Simone ◽  
Stefan De Gendt
Keyword(s):  
Trade Off ◽  
Post Exposure ◽  
Post Exposure Bake

A novel post exposure bake technique to improve CD uniformity over product wafers

2005 ◽  
Author(s):  
Tomoyuki Takeishi ◽  
K. Hayasaki ◽  
Tsuyoshi Shibata
Keyword(s):  
Post Exposure ◽  
Post Exposure Bake

Effect and procedures of post-exposure bake temperature optimization on the CD uniformity in a mass production environment

2007 ◽  
Author(s):  
Kirsten Ruck ◽  
Heiko Weichert ◽  
Steffen Hornig ◽  
Frank Finger ◽  
Göran Fleischer ◽  
...  
Keyword(s):  
Mass Production ◽  
Production Environment ◽  
Post Exposure ◽  
Temperature Optimization ◽  
Post Exposure Bake

Sub-millisecond post exposure bake of chemically amplified resists by CO 2 laser heat treatment

2010 ◽  
Author(s):  
Byungki Jung ◽  
Jing Sha ◽  
Florencia Paredes ◽  
Christopher K. Ober ◽  
Michael O. Thompson ◽  
...  
Keyword(s):  
Heat Treatment ◽  
Laser Heat Treatment ◽  
Post Exposure ◽  
Chemically Amplified ◽  
Laser Heat ◽  
Post Exposure Bake ◽  
Chemically Amplified Resists

Effect of Post Exposure Bake in Inorganic Electron Beam Resist and Utilizing for Nanoimprint Mold

2009 ◽  
Vol 9 (1) ◽  
pp. 562-566 ◽  
Author(s):  
Miyako Shizuno ◽  
Jun Taniguchi ◽  
Kenta Ogino ◽  
Kiyoshi Ishikawa
Keyword(s):  
Electron Beam ◽  
Post Exposure ◽  
Post Exposure Bake

Examination Of The Mechanism Of The Post Exposure Bake Effect

1988 ◽  
Author(s):  
P. Trefonas III ◽  
B. K. Daniels ◽  
M. J. Eller ◽  
A. Zampini
Keyword(s):  
Post Exposure ◽  
Post Exposure Bake

Evaluation of the new-type ESPACER adopted for its removal after post-exposure bake process

2005 ◽  
Author(s):  
Yoshihiro Saida ◽  
Takashi Okubo ◽  
Jun Sasaki ◽  
Toshio Konishi ◽  
Motohiko Morita
Keyword(s):  
Post Exposure ◽  
New Type ◽  
Post Exposure Bake
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