Fabrication of plasmonic thin films and their characterization by optical method and FDTD simulation technique

2015 ◽  
Author(s):  
A. Kuzma ◽  
F. Uherek ◽  
J. Škriniarová ◽  
D. Pudiš ◽  
M. Weis ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Method ◽  
Simulation Technique ◽  
Fdtd Simulation

Analysis of inhomogeneous thin films of ZrO2by the combined optical method and atomic force microscopy

2001 ◽  
Vol 32 (1) ◽  
pp. 91-94 ◽  
Author(s):  
D. Franta ◽  
I. Ohlídal ◽  
P. Klapetek ◽  
P. Pokorný ◽  
M. Ohlídal
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Optical Method ◽  
Force Microscopy ◽  
Atomic Force

scholarly journals Defect-Induced Tunable Permittivity of Epsilon-Near-Zero in Indium Tin Oxide Thin Films

Nanomaterials ◽  
2018 ◽  
Vol 8 (11) ◽  
pp. 922 ◽  
Author(s):  
Jiqing Lian ◽  
Dawei Zhang ◽  
Ruijin Hong ◽  
Peizhen Qiu ◽  
Taiguo Lv ◽  
...  
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Plasma Oscillation ◽  
Field Enhancement ◽  
Fdtd Simulation ◽  
Structural Defects ◽  
Defect States ◽  
Vacancy Defects ◽  
Epsilon Near Zero

Defect-induced tunable permittivity of Epsilon-Near-Zero (ENZ) in indium tin oxide (ITO) thin films via annealing at different temperatures with mixed gases (98% Ar, 2% O2) was reported. Red-shift of λENZ (Epsilon-Near-Zero wavelength) from 1422 nm to 1995 nm in wavelength was observed. The modulation of permittivity is dominated by the transformation of plasma oscillation frequency and carrier concentration depending on Drude model, which was produced by the formation of structural defects and the reduction of oxygen vacancy defects during annealing. The evolution of defects can be inferred by means of X-ray diffraction (XRD), atomic force microscopy (AFM), and Raman spectroscopy. The optical bandgaps (Eg) were investigated to explain the existence of defect states. And the formation of structure defects and the electric field enhancement were further verified by finite-difference time domain (FDTD) simulation.

FDTD Simulation on Transmittance of Silica Microsphere Thin Films with Varying Embedding in an Optical Adhesive

Optik ◽  
2021 ◽  
pp. 166997
Author(s):  
Xiangmeng Li ◽  
Xin Yan ◽  
Zepeng Zhao ◽  
Mazin Salah Mohamed ◽  
Jianqing Wang ◽  
...  
Keyword(s):  
Thin Films ◽  
Fdtd Simulation ◽  
Silica Microsphere ◽  
Optical Adhesive

Real Time Optical Method of Stress Measurements in Thin Films

1998 ◽  
Vol 287-288 ◽  
pp. 141-150 ◽  
Author(s):  
G. Moulard ◽  
G. Contoux ◽  
G. Motyl ◽  
M. Courbon
Keyword(s):  
Thin Films ◽  
Real Time ◽  
Optical Method ◽  
Stress Measurements

Investigation of Structure Development in Mod Pb(ZrxTi1-x)O3 Films by an Optical Method

1991 ◽  
Vol 243 ◽  
Author(s):  
Chien H. Peng ◽  
Seshu B. Desu
Keyword(s):  
Thin Films ◽  
Low Temperatures ◽  
Optical Method ◽  
Transformation Kinetics ◽  
X Ray Diffraction ◽  
Structure Development ◽  
X Ray ◽  
Pzt Films ◽  
Metalorganic Decomposition ◽  
Ray Methods

AbstractFor i roving the metalorganic decomposition (MOD) process, such that perovskite Pb(ZrxTi1-x)O3 thin films can be fabricated at low temperatures, understanding of structure development is required. Here we report a nondestructive optical method for investigating the structure development in MOD PZT films. Using this method we have identified the temperatures at which the formation of both pyrochlore and perovskite was completed as a function of Zr/Ti ratio. Also for PZT solid solutions, we have identified the temperatures at which the initial presence of both pyrochlore and perovskite was observed. These temperatures compare very well with those obtained from the X-ray diffraction studies. In contrast to X-ray methods, the proposed technique can also be effectively utilized for studying the pyrochlore formation from the amorphous phase. Furthermore, it was also shown that the optical method can be used for characterizing the phase transformation kinetics in PZT films.

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