Fabrication of high aspect ratio silicon gratings by interference lithography and potassium hydroxide anisotropic etch technique
Keyword(s):
2017 ◽
Vol 170
◽
pp. 49-53
◽
Keyword(s):
2014 ◽
Vol 32
(6)
◽
pp. 06FE01
◽
2013 ◽
Vol 24
(13)
◽
pp. 1857-1863
◽
Keyword(s):
2017 ◽
Vol 425
◽
pp. 553-557
◽
Keyword(s):
Keyword(s):
2021 ◽
Vol 39
(4)
◽
pp. 042601
Keyword(s):
2019 ◽
Vol 37
(6)
◽
pp. 060601
◽