Fabrication of high aspect ratio and tilted nanostructures using extreme ultraviolet and soft x-ray interference lithography

2021 ◽  
Vol 39 (4) ◽  
pp. 042601
Author(s):  
Nassir Mojarad ◽  
Dimitrios Kazazis ◽  
Yasin Ekinci
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Extreme Ultraviolet ◽  
Interference Lithography ◽  
X Ray

Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography

2017 ◽  
Vol 170 ◽  
pp. 49-53 ◽  
Author(s):  
Jun Zhao ◽  
Yanqing Wu ◽  
Chaofan Xue ◽  
Shumin Yang ◽  
Liansheng Wang ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Periodic Structures ◽  
Interference Lithography ◽  
X Ray

Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography

2017 ◽  
Vol 425 ◽  
pp. 553-557 ◽  
Author(s):  
Chaofan Xue ◽  
Jun Zhao ◽  
Yanqing Wu ◽  
Huaina Yu ◽  
Shumin Yang ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Interference Lithography ◽  
Large Area ◽  
Periodic Nanostructures ◽  
X Ray

Formation of GaN Self-Organized Nanotips by Nanomasking Effect

2001 ◽  
Vol 707 ◽  
Author(s):  
Harumasa Yoshida ◽  
Tatsuhiro Urushido ◽  
Hideto Miyake ◽  
Kazumasa Hiramtsu
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Aspect Ratio ◽  
Formation Mechanism ◽  
High Aspect Ratio ◽  
Photoelectron Spectroscopy ◽  
Nanometer Scale ◽  
Xps Analysis ◽  
X Ray ◽  
Self Organized

ABSTRACTWe have successfully fabricated self-organized GaN nanotips by reactive ion etching using chlorine plasma, and have revealed the formation mechanism. Nanotips with a high density and a high aspect ratio have been formed after the etching. We deduce from X-ray photoelectron spectroscopy (XPS) analysis that the nanotip formation is attributed to nanometer-scale masks of SiO2 on GaN. The structures calculated by Monte Carlo simulation of our formation mechanism are very similar to the experimental nanotip structures.

scholarly journals Progress in the fabrication of high-aspect-ratio zone plates by soft x-ray lithography

2002 ◽  
Author(s):  
Ralu Divan ◽  
Derrick C. Mancini ◽  
Nicolai A. Moldovan ◽  
Barry P. Lai ◽  
Lahsen Assoufid ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
X Ray ◽  
Zone Plates
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