Wide band antireflection coatings deposited by atomic layer deposition

Author(s):  
April D. Jewell ◽  
John Hennessy ◽  
Michael E. Hoenk ◽  
Shouleh Nikzad
2021 ◽  
Author(s):  
Ran Zhao ◽  
Kai Zhang ◽  
Jiahao Zhu ◽  
Shuang Xiao ◽  
Wei Xiong ◽  
...  

Interface passivation is of the pivot to achieve high-efficiency organic metal halide perovskite solar cells (PSCs). Atomic layer deposition (ALD) of wide band gap oxides has recently shown great potential...


Coatings ◽  
2020 ◽  
Vol 10 (1) ◽  
pp. 64 ◽  
Author(s):  
Pallabi Paul ◽  
Kristin Pfeiffer ◽  
Adriana Szeghalmi

Antireflection coatings (ARC) are essential for various optical components including such made of plastics for high volume applications. However, precision coatings on plastics are rather challenging due to typically low adhesion of the coating to the substrate. In this work, optimization of the atomic layer deposition (ALD) processes towards conformal optical thin films of Al2O3, TiO2 and SiO2 on poly(methyl methacrylate) (PMMA) has been carried out and a five-layer ARC is demonstrated. While the uncoated PMMA substrates have a reflectance of nearly 8% in the visible (VIS) spectral range, this is reduced below 1.2% for the spectral range of 420–670 nm by applying a double-side ARC. The total average reflectance is 0.7%. The optimized ALD coatings show a good adhesion to the PMMA substrates even after the climate test. Microscopic analysis on the cross-hatch areas on PMMA after the climate test indicates very good environmental stability of the ALD coatings. These results enable a possible route by ALD to deposit uniform, crack free, adhesive and environmentally durable thin film layers on sensitive thermoplastics like PMMA.


Coatings ◽  
2017 ◽  
Vol 7 (8) ◽  
pp. 118 ◽  
Author(s):  
Kristin Pfeiffer ◽  
Ulrike Schulz ◽  
Andreas Tünnermann ◽  
Adriana Szeghalmi

2012 ◽  
Vol 20 (2) ◽  
pp. 854 ◽  
Author(s):  
Zhichao Liu ◽  
Songlin Chen ◽  
Ping Ma ◽  
Yaowei Wei ◽  
Yi Zheng ◽  
...  

2009 ◽  
Vol 48 (9) ◽  
pp. 1727 ◽  
Author(s):  
Adriana Szeghalmi ◽  
Michael Helgert ◽  
Robert Brunner ◽  
Frank Heyroth ◽  
Ulrich Gösele ◽  
...  

2019 ◽  
Vol 11 (24) ◽  
pp. 21887-21894 ◽  
Author(s):  
Kristin Pfeiffer ◽  
Lilit Ghazaryan ◽  
Ulrike Schulz ◽  
Adriana Szeghalmi

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