scholarly journals Grass-like Alumina with Low Refractive Index for Scalable, Broadband, Omnidirectional Antireflection Coatings on Glass Using Atomic Layer Deposition

2017 ◽  
Vol 9 (17) ◽  
pp. 15038-15043 ◽  
Author(s):  
Christoffer Kauppinen ◽  
Kirill Isakov ◽  
Markku Sopanen
Keyword(s):  
Refractive Index ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Antireflection Coatings ◽  
Layer Deposition ◽  
Low Refractive Index

scholarly journals Encapsulation of low-refractive-index SiO_2 nanorods by Al_2O_3 with atomic layer deposition

2007 ◽  
Vol 15 (24) ◽  
pp. 16285 ◽  
Author(s):  
Sangho S. Kim ◽  
Nicholas T. Gabriel ◽  
Woo-Bin Song ◽  
Joseph J. Talghader
Keyword(s):  
Refractive Index ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Low Refractive Index

scholarly journals Antireflection Coating on PMMA Substrates by Atomic Layer Deposition

Coatings ◽  
2020 ◽  
Vol 10 (1) ◽  
pp. 64 ◽  
Author(s):  
Pallabi Paul ◽  
Kristin Pfeiffer ◽  
Adriana Szeghalmi
Keyword(s):  
Atomic Layer Deposition ◽  
Spectral Range ◽  
Microscopic Analysis ◽  
Atomic Layer ◽  
High Volume ◽  
Antireflection Coating ◽  
Environmental Stability ◽  
Antireflection Coatings ◽  
Layer Deposition ◽  
Average Reflectance

Antireflection coatings (ARC) are essential for various optical components including such made of plastics for high volume applications. However, precision coatings on plastics are rather challenging due to typically low adhesion of the coating to the substrate. In this work, optimization of the atomic layer deposition (ALD) processes towards conformal optical thin films of Al2O3, TiO2 and SiO2 on poly(methyl methacrylate) (PMMA) has been carried out and a five-layer ARC is demonstrated. While the uncoated PMMA substrates have a reflectance of nearly 8% in the visible (VIS) spectral range, this is reduced below 1.2% for the spectral range of 420–670 nm by applying a double-side ARC. The total average reflectance is 0.7%. The optimized ALD coatings show a good adhesion to the PMMA substrates even after the climate test. Microscopic analysis on the cross-hatch areas on PMMA after the climate test indicates very good environmental stability of the ALD coatings. These results enable a possible route by ALD to deposit uniform, crack free, adhesive and environmentally durable thin film layers on sensitive thermoplastics like PMMA.

Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films

2015 ◽  
Vol 33 (1) ◽  
pp. 01A111 ◽  
Author(s):  
Hao Van Bui ◽  
Frank B. Wiggers ◽  
Anubha Gupta ◽  
Minh D. Nguyen ◽  
Antonius A. I. Aarnink ◽  
...  
Keyword(s):  
Refractive Index ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Initial Growth ◽  
Layer Deposition

scholarly journals Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition

Coatings ◽  
2017 ◽  
Vol 7 (8) ◽  
pp. 118 ◽  
Author(s):  
Kristin Pfeiffer ◽  
Ulrike Schulz ◽  
Andreas Tünnermann ◽  
Adriana Szeghalmi
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Antireflection Coatings ◽  
Layer Deposition ◽  
Curved Glass ◽  
Glass Lenses

Refractive index and bandgap variation in Al2O3-ZnO ultrathin multilayers prepared by atomic layer deposition

2017 ◽  
Vol 691 ◽  
pp. 308-315 ◽  
Author(s):  
J. López ◽  
E. Solorio ◽  
H.A. Borbón-Nuñez ◽  
F.F. Castillón ◽  
R. Machorro ◽  
...  
Keyword(s):  
Refractive Index ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Characterization of 1064nm nanosecond laser-induced damage on antireflection coatings grown by atomic layer deposition

2012 ◽  
Vol 20 (2) ◽  
pp. 854 ◽  
Author(s):  
Zhichao Liu ◽  
Songlin Chen ◽  
Ping Ma ◽  
Yaowei Wei ◽  
Yi Zheng ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Nanosecond Laser ◽  
Antireflection Coatings ◽  
Layer Deposition ◽  
Laser Induced Damage

scholarly journals Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films

2013 ◽  
Vol 4 ◽  
pp. 732-742 ◽  
Author(s):  
Jörg Haeberle ◽  
Karsten Henkel ◽  
Hassan Gargouri ◽  
Franziska Naumann ◽  
Bernd Gruska ◽  
...  
Keyword(s):  
Growth Rate ◽  
Refractive Index ◽  
Atomic Layer Deposition ◽  
Photoelectron Spectroscopy ◽  
Film Growth ◽  
Atomic Layer ◽  
Silicon Substrates ◽  
Initial State ◽  
Elemental Ratios ◽  
Layer Deposition

We report on results on the preparation of thin (<100 nm) aluminum oxide (Al2O3) films on silicon substrates using thermal atomic layer deposition (T-ALD) and plasma enhanced atomic layer deposition (PE-ALD) in the SENTECH SI ALD LL system. The T-ALD Al2O3 layers were deposited at 200 °C, for the PE-ALD films we varied the substrate temperature range between room temperature (rt) and 200 °C. We show data from spectroscopic ellipsometry (thickness, refractive index, growth rate) over 4” wafers and correlate them to X-ray photoelectron spectroscopy (XPS) results. The 200 °C T-ALD and PE-ALD processes yield films with similar refractive indices and with oxygen to aluminum elemental ratios very close to the stoichiometric value of 1.5. However, in both also fragments of the precursor are integrated into the film. The PE-ALD films show an increased growth rate and lower carbon contaminations. Reducing the deposition temperature down to rt leads to a higher content of carbon and CH-species. We also find a decrease of the refractive index and of the oxygen to aluminum elemental ratio as well as an increase of the growth rate whereas the homogeneity of the film growth is not influenced significantly. Initial state energy shifts in all PE-ALD samples are observed which we attribute to a net negative charge within the films.

Wide band antireflection coatings deposited by atomic layer deposition

2013 ◽  
Author(s):  
April D. Jewell ◽  
John Hennessy ◽  
Michael E. Hoenk ◽  
Shouleh Nikzad
Keyword(s):  
Atomic Layer Deposition ◽  
Wide Band ◽  
Atomic Layer ◽  
Antireflection Coatings ◽  
Layer Deposition
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