Fabrication and electrical characterization of Pd/TiO2/n-Si MIS structure using TiO2film as insulator layer deposited by low temperature arc vapor deposition process

Mapping Intimacies ◽

10.1117/12.2009612 ◽

2013 ◽

Author(s):

Kumar Shubham ◽

R. U. Khan ◽

P. Chakrabarti

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Electrical Characterization ◽

Deposition Process ◽

Mis Structure ◽

Insulator Layer ◽

Vapor Deposition Process

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Fabrication and Characterization of Pd/TiO2/Si MIS Structure with TiO2 Film as Insulator Layer Deposited by Low Temperature Arc Vapor Deposition Process

Advanced Science Focus ◽

10.1166/asfo.2013.1009 ◽

2013 ◽

Vol 1 (2) ◽

pp. 156-161

Author(s):

Kumar Shubham ◽

R. U. Khan ◽

P. Chakrabarti

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Deposition Process ◽

Mis Structure ◽

Insulator Layer ◽

Fabrication And Characterization ◽

Vapor Deposition Process

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Microstructural and Optical Characterization of TiO2 Doped with Ytterbium Synthesized by Sol–Gel and Solar Physical Vapor Deposition Process

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2012.6152 ◽

2012 ◽

Vol 12 (5) ◽

pp. 3760-3765 ◽

Cited By ~ 6

Author(s):

Janusz D. Fidelus ◽

Mariusz Barczak ◽

Katarzyna Michalak ◽

Zygmunt Fekner ◽

Anna Dużyńska ◽

...

Keyword(s):

Vapor Deposition ◽

Physical Vapor Deposition ◽

Sol Gel ◽

Optical Characterization ◽

Deposition Process ◽

Physical Vapor Deposition Process ◽

Vapor Deposition Process

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Characterization of Surface Metal Particulate Contamination Using the Polysilicon Chemical Vapor Deposition Process

Particles on Surfaces 3 ◽

10.1007/978-1-4899-2367-7_12 ◽

1991 ◽

pp. 143-152 ◽

Cited By ~ 1

Author(s):

William A. Syverson ◽

Paul J. Schubring

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Particulate Contamination ◽

Surface Metal ◽

Vapor Deposition Process

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Characterization of highly textured piezoelectric AlN films obtained from aluminum and ammonium chloride by a simple vapor deposition process

Thin Solid Films ◽

10.1016/j.tsf.2019.05.049 ◽

2019 ◽

Vol 684 ◽

pp. 15-20

Author(s):

A.N. Redkin ◽

E.E. Yakimov ◽

D.V. Roshchupkin ◽

V.I. Korepanov

Keyword(s):

Ammonium Chloride ◽

Vapor Deposition ◽

Deposition Process ◽

Vapor Deposition Process

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Low Temperature Growth of Graphene on Glass by Carbon-Enclosed Chemical Vapor Deposition Process and Its Application as Transparent Electrode

Chemistry of Materials ◽

10.1021/cm504431d ◽

2015 ◽

Vol 27 (5) ◽

pp. 1646-1655 ◽

Cited By ~ 30

Author(s):

Yu-Ze Chen ◽

Henry Medina ◽

Hung-Wei Tsai ◽

Yi-Chung Wang ◽

Yu-Ting Yen ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Transparent Electrode ◽

Chemical Vapor Deposition Process ◽

Temperature Growth ◽

Low Temperature Growth ◽

Vapor Deposition Process

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Development of a low-temperature GaN chemical vapor deposition process based on a single molecular source H2GaN3

Applied Physics Letters ◽

10.1063/1.123398 ◽

1999 ◽

Vol 74 (6) ◽

pp. 883-885 ◽

Cited By ~ 28

Author(s):

Jeff McMurran ◽

J. Kouvetakis ◽

David J. Smith

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Molecular Source ◽

Vapor Deposition Process

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A low temperature () chemical vapor deposition process for the deposition of device-quality epitaxial silicon

Materials Science and Engineering B ◽

10.1016/0921-5107(88)90035-9 ◽

1988 ◽

Vol 1 (1) ◽

pp. 131-134 ◽

Cited By ~ 1

Author(s):

W.R. Burger ◽

R. Reif

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Epitaxial Silicon ◽

Vapor Deposition Process

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Electrical characterization of graphene films synthesized by low-temperature microwave plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.4825103 ◽

2013 ◽

Vol 103 (15) ◽

pp. 153106 ◽

Cited By ~ 15

Author(s):

Yuki Okigawa ◽

Kazuo Tsugawa ◽

Takatoshi Yamada ◽

Masatou Ishihara ◽

Masataka Hasegawa

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Microwave Plasma ◽

Electrical Characterization ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Graphene Films

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Low-temperature Si and Si:Ge epitaxy by ultrahigh-vacuum/chemical vapor deposition: Process fundamentals

IBM Journal of Research and Development ◽

10.1147/rd.346.0806 ◽

1990 ◽

Vol 34 (6) ◽

pp. 806-815 ◽

Cited By ~ 47

Author(s):

B. S. Meyerson

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Ultrahigh Vacuum ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Vapor Deposition Process

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Characterization of the polyurea polymeric waveguides fabricated using the chemical vapor deposition process

Optics & Laser Technology ◽

10.1016/j.optlastec.2007.09.006 ◽

2008 ◽

Vol 40 (4) ◽

pp. 607-613

Author(s):

Shug-June Hwang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Vapor Deposition Process

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