Electrical characterization of graphene films synthesized by low-temperature microwave plasma chemical vapor deposition

Yuki Okigawa; Kazuo Tsugawa; Takatoshi Yamada; Masatou Ishihara; Masataka Hasegawa

doi:10.1063/1.4825103

Electrical characterization of graphene films synthesized by low-temperature microwave plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.4825103 ◽

2013 ◽

Vol 103 (15) ◽

pp. 153106 ◽

Cited By ~ 15

Author(s):

Yuki Okigawa ◽

Kazuo Tsugawa ◽

Takatoshi Yamada ◽

Masatou Ishihara ◽

Masataka Hasegawa

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Microwave Plasma ◽

Electrical Characterization ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Graphene Films

Download Full-text

A roll-to-roll microwave plasma chemical vapor deposition process for the production of 294mm width graphene films at low temperature

Carbon ◽

10.1016/j.carbon.2012.02.020 ◽

2012 ◽

Vol 50 (7) ◽

pp. 2615-2619 ◽

Cited By ~ 123

Author(s):

Takatoshi Yamada ◽

Masatou Ishihara ◽

Jaeho Kim ◽

Masataka Hasegawa ◽

Sumio Iijima

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Process ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Roll To Roll ◽

Graphene Films

Download Full-text

Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Characterization of the process, chemical structure, and surface morphology of the films

Diamond and Related Materials ◽

10.1016/j.diamond.2005.11.011 ◽

2006 ◽

Vol 15 (9) ◽

pp. 1484-1491 ◽

Cited By ~ 11

Author(s):

I. Blaszczyk-Lezak ◽

A.M. Wrobel ◽

M.P.M. Kivitorma ◽

I.J. Vayrynen ◽

T. Aoki

Keyword(s):

Chemical Vapor Deposition ◽

Surface Morphology ◽

Vapor Deposition ◽

Chemical Structure ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

Download Full-text

Growth and characterization of diamond films on TiN/Si(100) by microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2008.10.018 ◽

2009 ◽

Vol 18 (2-3) ◽

pp. 124-127 ◽

Cited By ~ 2

Author(s):

Wei-Chun Chen ◽

Wei-Lin Wang ◽

Rajanish N. Tiwari ◽

Li Chang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

Download Full-text

Growth and Characterization of the Laterally Enlarged Single Crystal Diamond Grown by Microwave Plasma Chemical Vapor Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/35/7/078101 ◽

2018 ◽

Vol 35 (7) ◽

pp. 078101 ◽

Cited By ~ 1

Author(s):

Ze-Yang Ren ◽

Jin-Feng Zhang ◽

Jin-Cheng Zhang ◽

Sheng-Rui Xu ◽

Chun-Fu Zhang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Single Crystal ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Single Crystal Diamond

Download Full-text

Characterization of Surface Conductive Diamond Layer Grown by Microwave Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l987 ◽

1993 ◽

Vol 32 (Part 2, No. 7B) ◽

pp. L987-L989 ◽

Cited By ~ 27

Author(s):

Yusuke Mori ◽

Yoshiyuki Show ◽

Masahiro Deguchi ◽

Hiromasa Yagi ◽

Hiroyuki Yagyu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Diamond Layer

Download Full-text

Characterization of transport properties of multiwalled carbon nanotube networks by microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2006.01.006 ◽

2006 ◽

Vol 15 (4-8) ◽

pp. 1138-1142 ◽

Cited By ~ 3

Author(s):

Yasuhiko Hayashi ◽

T. Tokunaga ◽

K. Kaneko ◽

Z. Horita

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Nanotube ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Multiwalled Carbon ◽

Plasma Chemical Vapor Deposition ◽

Carbon Nanotube Networks

Download Full-text

Low-Temperature Deposition of SiC Films by Microwave-Plasma Chemical Vapor Deposition

Journal of the Ceramic Society of Japan ◽

10.2109/jcersj.102.13 ◽

1994 ◽

Vol 102 (1181) ◽

pp. 13-17 ◽

Cited By ~ 4

Author(s):

Satoshi AOYAMA ◽

Noriyoshi SHIBATA

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Low Temperature Deposition ◽

Temperature Deposition ◽

Sic Films

Download Full-text

Growth and characterization of silicon nitride films produced by remote microwave plasma chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577211 ◽

1991 ◽

Vol 9 (5) ◽

pp. 2594-2601 ◽

Cited By ~ 25

Author(s):

D. Landheer ◽

N. G. Skinner ◽

T. E. Jackman ◽

D. A. Thompson ◽

J. G. Simmons ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Silicon Nitride Films

Download Full-text

Diamond films produced by microwave plasma chemical vapor deposition at low temperature and their characterization

Materials Science and Engineering A ◽

10.1016/j.msea.2006.12.139 ◽

2008 ◽

Vol 475 (1-2) ◽

pp. 17-19 ◽

Cited By ~ 3

Author(s):

Lin Wang ◽

Yongming Wang ◽

Jian Zhou ◽

Shixi Ouyang

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

Download Full-text

Characterization of Tensile Strained Si1-yCyAlloy Grown by Photo- and Plasma Chemical Vapor Deposition at Very Low Temperature

Japanese Journal of Applied Physics ◽

10.1143/jjap.40.4440 ◽

2001 ◽

Vol 40 (Part 1, No. 7) ◽

pp. 4440-4444 ◽

Cited By ~ 3

Author(s):

Katsuya Abe ◽

Shuhei Yagi ◽

Takashi Okabayashi ◽

Akira Yamada ◽

Makoto Konagai

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Very Low Temperature

Download Full-text