Accurate measurement of very small line patterns in critical dimension scanning electron microscopy using model-based library matching technique

Chie Shishido

doi:10.1117/1.3541780

Accurate measurement of very small line patterns in critical dimension scanning electron microscopy using model-based library matching technique

Journal of Micro/Nanolithography MEMS and MOEMS ◽

10.1117/1.3541780 ◽

2011 ◽

Vol 10 (1) ◽

pp. 013010 ◽

Cited By ~ 6

Author(s):

Chie Shishido

Keyword(s):

Electron Microscopy ◽

Scanning Electron Microscopy ◽

Critical Dimension ◽

Model Based ◽

Matching Technique ◽

Line Patterns ◽

Scanning Electron

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Model-Based Scanning Electron Microscopy Critical-Dimension Metrology for 3D Nanostructures

Metrology and Diagnostic Techniques for Nanoelectronics ◽

10.1201/9781315185385-3 ◽

2016 ◽

pp. 3-30

Author(s):

András Vladár

Keyword(s):

Electron Microscopy ◽

Scanning Electron Microscopy ◽

Critical Dimension ◽

Model Based ◽

3D Nanostructures ◽

Scanning Electron

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Monte Carlo modeling of the extraction of roughness parameters at nanometer scale by Critical Dimension Scanning Electron Microscopy

2014 44th European Solid State Device Research Conference (ESSDERC) ◽

10.1109/essderc.2014.6948834 ◽

2014 ◽

Cited By ~ 1

Author(s):

M. Ciappa ◽

E. Ilgunsatiroglu ◽

A. Yu. Illarionov ◽

F. Filosomi ◽

C. Santini

Keyword(s):

Electron Microscopy ◽

Scanning Electron Microscopy ◽

Monte Carlo ◽

Critical Dimension ◽

Nanometer Scale ◽

Roughness Parameters ◽

Monte Carlo Modeling ◽

Scanning Electron

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Mechanism of ArF resist-pattern shrinkage in critical-dimension scanning electron microscopy measurement

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1643055 ◽

2004 ◽

Vol 22 (1) ◽

pp. 226 ◽

Cited By ~ 13

Author(s):

Tsukasa Azuma ◽

Kenji Chiba ◽

Hideaki Abe ◽

Hiroshi Motoki ◽

Noriaki Sasaki

Keyword(s):

Electron Microscopy ◽

Scanning Electron Microscopy ◽

Critical Dimension ◽

Scanning Electron Microscopy Measurement ◽

Microscopy Measurement ◽

Scanning Electron

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Unbiased line width roughness measurements with critical dimension scanning electron microscopy and critical dimension atomic force microscopy

Journal of Applied Physics ◽

10.1063/1.4705509 ◽

2012 ◽

Vol 111 (8) ◽

pp. 084318 ◽

Cited By ~ 33

Author(s):

L. Azarnouche ◽

E. Pargon ◽

K. Menguelti ◽

M. Fouchier ◽

D. Fuard ◽

...

Keyword(s):

Electron Microscopy ◽

Scanning Electron Microscopy ◽

Atomic Force Microscopy ◽

Line Width ◽

Critical Dimension ◽

Force Microscopy ◽

Atomic Force ◽

Roughness Measurements ◽

Scanning Electron

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Modeling secondary electron images for linewidth measurement by critical dimension scanning electron microscopy

Microelectronics Reliability ◽

10.1016/j.microrel.2010.07.120 ◽

2010 ◽

Vol 50 (9-11) ◽

pp. 1407-1412 ◽

Cited By ~ 22

Author(s):

Mauro Ciappa ◽

Alexander Koschik ◽

Maurizio Dapor ◽

Wolfgang Fichtner

Keyword(s):

Electron Microscopy ◽

Scanning Electron Microscopy ◽

Secondary Electron ◽

Critical Dimension ◽

Linewidth Measurement ◽

Scanning Electron

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A novel Monte Carlo simulation code for linewidth measurement in critical dimension scanning electron microscopy

10.1117/12.853804 ◽

2010 ◽

Cited By ~ 13

Author(s):

Alexander Koschik ◽

Mauro Ciappa ◽

Stephan Holzer ◽

Maurizio Dapor ◽

Wolfgang Fichtner

Keyword(s):

Electron Microscopy ◽

Scanning Electron Microscopy ◽

Monte Carlo Simulation ◽

Monte Carlo ◽

Critical Dimension ◽

Simulation Code ◽

Linewidth Measurement ◽

Scanning Electron

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Extraction of roughness parameters at nanometer scale by Monte Carlo simulation of Critical Dimension Scanning Electron Microscopy

Solid-State Electronics ◽

10.1016/j.sse.2015.05.016 ◽

2015 ◽

Vol 113 ◽

pp. 73-78 ◽

Cited By ~ 3

Author(s):

M. Ciappa ◽

E. Ilgünsatiroglu ◽

A.Yu. Illarionov

Keyword(s):

Electron Microscopy ◽

Scanning Electron Microscopy ◽

Monte Carlo Simulation ◽

Monte Carlo ◽

Critical Dimension ◽

Nanometer Scale ◽

Roughness Parameters ◽

Scanning Electron

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Characterization of 193-nm resist layers by critical dimension-scanning electron microscopy sidewall imaging

Journal of Micro/Nanolithography MEMS and MOEMS ◽

10.1117/1.1857534 ◽

2005 ◽

Vol 4 (1) ◽

pp. 013007

Author(s):

Christian Stief

Keyword(s):

Electron Microscopy ◽

Scanning Electron Microscopy ◽

Critical Dimension ◽

193 Nm ◽

Scanning Electron

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Understanding the relationship between true and measured resist feature critical dimension and line edge roughness using a detailed scanning electron microscopy simulator

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3517717 ◽

2010 ◽

Vol 28 (6) ◽

pp. C6H34-C6H39 ◽

Cited By ~ 8

Author(s):

Richard A. Lawson ◽

Clifford L. Henderson

Keyword(s):

Electron Microscopy ◽

Scanning Electron Microscopy ◽

Critical Dimension ◽

Line Edge Roughness ◽

Edge Roughness ◽

The Relationship ◽

Scanning Electron

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Monte Carlo modeling in the low-energy domain of the secondary electron emission of polymethylmethacrylate for critical-dimension scanning electron microscopy

Journal of Micro/Nanolithography MEMS and MOEMS ◽

10.1117/1.3373517 ◽

2010 ◽

Vol 9 (2) ◽

pp. 023001 ◽

Cited By ~ 36

Author(s):

Mauro Ciappa

Keyword(s):

Electron Microscopy ◽

Scanning Electron Microscopy ◽

Electron Emission ◽

Secondary Electron ◽

Secondary Electron Emission ◽

Critical Dimension ◽

Low Energy ◽

Monte Carlo Modeling ◽

Energy Domain ◽

Scanning Electron

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