Negative-cluster ion beam production from the tip of a sharp needle: Suppression of surface charging and surface analysis of an insulated sample

2021 ◽  
Vol 39 (6) ◽  
pp. 063218
Author(s):  
Yukio Fujiwara ◽  
Naoaki Saito
Keyword(s):  
Surface Analysis ◽  
Ion Beam ◽  
Surface Charging ◽  
Beam Production ◽  
Cluster Ion ◽  
Sharp Needle

Time-of-flight secondary ion mass spectroscopy for surface analysis of insulators using a cluster ion beam

2003 ◽  
Vol 83 (23) ◽  
pp. 4872-4874 ◽  
Author(s):  
K. Hirata ◽  
Y. Saitoh ◽  
A. Chiba ◽  
K. Narumi ◽  
Y. Kobayashi ◽  
...  
Keyword(s):  
Surface Analysis ◽  
Mass Spectroscopy ◽  
Ion Beam ◽  
Time Of Flight ◽  
Secondary Ion Mass Spectroscopy ◽  
Cluster Ion ◽  
Secondary Ion

Cluster Ion Beam Processing: Review of Current and Prospective Applications

2011 ◽  
Vol 1354 ◽  
Author(s):  
Isao Yamada ◽  
Joseph Khoury
Keyword(s):  
Surface Analysis ◽  
Energy Surface ◽  
Ion Beam ◽  
Industrial Applications ◽  
Low Energy ◽  
High Rate ◽  
Cluster Ions ◽  
Current Status ◽  
Cluster Ion ◽  
Beam Characteristics

ABSTRACTCluster ion beam processes which employ ions comprised of a few hundred to several thousand atoms are being developed into a new field of ion beam technology. The processes are characterized by low energy surface interaction effects, lateral sputtering phenomena and high-rate chemical reaction effects. This paper reviews the current status of studies of the fundamental cluster ion beam characteristics as they apply to nanoscale processing and present industrial applications. As new prospective applications, techniques are now being developed to employ cluster ions in surface analysis tools such as XPS and SIMS and to modify surfaces of bio-materials. Results related to these new projects will also be reviewed.

Gas cluster ion beam processing equipment

2002 ◽  
Author(s):  
J. Bachand ◽  
A. Freytsis ◽  
E. Harrington ◽  
M. Gwinn ◽  
N. Hofmeester ◽  
...  
Keyword(s):  
Ion Beam ◽  
Processing Equipment ◽  
Cluster Ion ◽  
Gas Cluster Ion Beam

Gas Cluster Ion Beam Processing for Si Photonics

2007 ◽  
Author(s):  
N. Toyoda ◽  
l. Yamada ◽  
S. Akiyama ◽  
L.C. Kimerling ◽  
Y. Ishikawa ◽  
...  
Keyword(s):  
Ion Beam ◽  
Si Photonics ◽  
Cluster Ion ◽  
Gas Cluster Ion Beam

Development of Cu Etching Using O$_{2}$ Cluster Ion Beam under Acetic Acid Gas Atmosphere

2012 ◽  
Vol 51 ◽  
pp. 08HA02 ◽  
Author(s):  
Takanori Suda ◽  
Noriaki Toyoda ◽  
Ken-ichi Hara ◽  
Isao Yamada
Keyword(s):  
Acetic Acid ◽  
Ion Beam ◽  
Acid Gas ◽  
Gas Atmosphere ◽  
Cluster Ion
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