Influence of chemical vapor precursor flow rate on the structure and thermal stability of phase-modulated VSiCN/Ag coatings

2021 ◽  
Vol 39 (6) ◽  
pp. 063409
Author(s):  
Forest C. Thompson ◽  
Frank M. Kustas ◽  
Kent E. Coulter ◽  
Grant A. Crawford
Keyword(s):  
Thermal Stability ◽  
Flow Rate ◽  
Chemical Vapor ◽  
Thermal Stability Of

The thermal stability of SiGe films deposited by ultrahigh‐vacuum chemical vapor deposition

1991 ◽  
Vol 70 (3) ◽  
pp. 1416-1420 ◽  
Author(s):  
S. R. Stiffler ◽  
J. H. Comfort ◽  
C. L. Stanis ◽  
D. L. Harame ◽  
E. de Frésart ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Ultrahigh Vacuum ◽  
Chemical Vapor ◽  
Thermal Stability Of

Thermal Stability, Structure and Mechanical Properties of TiSiN Coatings Prepared by Reactive DC Magnetron Co-Sputtering

2006 ◽  
Vol 509 ◽  
pp. 93-98 ◽  
Author(s):  
L. García-González ◽  
J. Morales-Hernández ◽  
F.J. Espinoza-Beltrán ◽  
J. Muñoz-Saldaña ◽  
T. Scholz ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Thermal Stability ◽  
Crystallite Size ◽  
Flow Rate ◽  
Air Atmosphere ◽  
Corning Glass ◽  
Stability Structure ◽  
Nitrogen Ratio ◽  
Steel Substrates ◽  
Thermal Stability Of

TiSiN coatings have been prepared by reactive DC magnetron co-sputtering on Corning glass and carbon steel substrates, using Ti-Si targets, with a constant Si:Ti area ratio of 0.2. The flow rate of nitrogen has been varied from 1.6 to 7.0 sccm, for a fixed argon flow rate of 25.0 sccm. We present a study of structure (texture, crystallite size and microstrain), chemical composition, and mechanical properties of the coatings and their dependence on the argon/nitrogen ratio. Moreover, a study of the thermal stability of the coatings has been performed by means of thermal annealing under oxidizing conditions (air atmosphere) at 500 and 600 °C. Coatings with the smallest crystallite size (∼2 nm) present the highest hardness (26 GPa) and the best thermal stability.

Thermal Stability of Cubic Boron Nitride Films Deposited by Chemical Vapor Deposition.

ChemInform ◽  
2007 ◽  
Vol 38 (2) ◽  
Author(s):  
J. Yu ◽  
Z. Zheng ◽  
H. C. Ong ◽  
K. Y. Wong ◽  
S. Matsumoto ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Chemical Vapor Deposition ◽  
Boron Nitride ◽  
Vapor Deposition ◽  
Cubic Boron Nitride ◽  
Chemical Vapor ◽  
Boron Nitride Films ◽  
Thermal Stability Of

Thermal Stability of Amorphous-like WNx/W Bilayered Diffusion Barrier for Chemical Vapor Deposited-Tungsten/p+-Si Contact System

1999 ◽  
Vol 38 (Part 1, No. 3A) ◽  
pp. 1343-1351 ◽  
Author(s):  
Kow-Ming Chang ◽  
I-Chung Deng ◽  
Ta-Hsun Yeh ◽  
Kuen-Der Lain ◽  
Chao-Ming Fu
Keyword(s):  
Thermal Stability ◽  
Diffusion Barrier ◽  
Chemical Vapor ◽  
Contact System ◽  
Chemical Vapor Deposited ◽  
Thermal Stability Of
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