scholarly journals Study of a linear surface wave plasma source for tin removal in an extreme ultraviolet source

2020 ◽  
Vol 38 (5) ◽  
pp. 052601
Author(s):  
Dren Qerimi ◽  
Gianluca Panici ◽  
Arihant Jain ◽  
Daniel Jacobson ◽  
David N. Ruzic
Keyword(s):  
Surface Wave ◽  
Extreme Ultraviolet ◽  
Plasma Source ◽  
Tin Removal

Efficient extreme ultraviolet plasma source generated by a CO2 laser and a liquid xenon microjet target

2007 ◽  
Vol 90 (19) ◽  
pp. 191503 ◽  
Author(s):  
Yoshifumi Ueno ◽  
Tatsuya Ariga ◽  
George Soumagne ◽  
Takeshi Higashiguchi ◽  
Shoichi Kubodera ◽  
...  
Keyword(s):  
Co2 Laser ◽  
Extreme Ultraviolet ◽  
Plasma Source ◽  
Liquid Xenon

Development of a large-area planar surface-wave plasma source with a cavity launcher driven by a 915 MHz UHF wave

2013 ◽  
Vol 22 (2) ◽  
pp. 025002 ◽  
Author(s):  
Xijiang Chang ◽  
Kazuki Kunii ◽  
Rongqing Liang ◽  
Masaaki Nagatsu
Keyword(s):  
Surface Wave ◽  
Plasma Source ◽  
Planar Surface ◽  
Large Area

scholarly journals A Surface-Wave Plasma Source with Magnetic Multicusp Fields

1998 ◽  
Vol 118 (11) ◽  
pp. 1201-1208
Author(s):  
Mutumi Tuda ◽  
Kouichi Ono ◽  
Masaaki Tsuchihashi ◽  
Minoru Hanazaki ◽  
Toshio Komemura
Keyword(s):  
Surface Wave ◽  
Plasma Source

Obtaining high rates for the etching and ashing for large liquid-crystal display substrates by using a surface-wave plasma source

2004 ◽  
Vol 87 (6) ◽  
pp. 28-38
Author(s):  
Katsuaki Aoki ◽  
Shin-ichiro Uekusa ◽  
Takeshi Yamauchi ◽  
Masashi Yamage ◽  
Shuichi Saito ◽  
...  
Keyword(s):  
Liquid Crystal ◽  
Surface Wave ◽  
Liquid Crystal Display ◽  
Plasma Source

Fabrication of Tin Loaded Resorcinol Formaldehyde Aerogel Spheres for Extreme Ultraviolet Source Emission

2006 ◽  
Vol 961 ◽  
Author(s):  
Reny R Paguio ◽  
Abbas Nikroo ◽  
Chris A Frederick ◽  
Jared F Hund ◽  
Mary Thi
Keyword(s):  
Extreme Ultraviolet ◽  
Laser System ◽  
Plasma Source ◽  
Full Density ◽  
Low Density ◽  
Resorcinol Formaldehyde ◽  
Source Materials ◽  
Similar Intensity ◽  
Microencapsulation Method ◽  
Source Emission

ABSTRACTLow density Sn doped resorcinol formaldehyde aerogels were fabricated for extreme ultraviolet (EUV) source emission lithography experiments (EUVL). EUVL is a candidate to succeed conventional optical lithography. EUVL requires a reliable emission (13.5 nm) source. One type of source is a laser-produced plasma. Several laser-plasma source materials have been considered such as lithium, xenon and tin. Tin is considered ideal because it has a high conversion effeciency. However, solid tin targets create a large quantity of debris which can damage the optics of the laser system. As a solution to this problem, we minimized the amount of tin by dispersing it in a low density resorcinol formaldehyde (R/F) matrix. These targets were fabricated into small spheres using the microencapsulation method. Initial experimental results show that these targets yield a similar intensity in the EUV regime when compred to a full density Sn target.

Absorption of extreme ultraviolet light in a laser produced gas-jet plasma source

2001 ◽  
Vol 90 (8) ◽  
pp. 3726-3734 ◽  
Author(s):  
Michael Kanouff ◽  
Harry Shields ◽  
Luis Bernardez ◽  
Donald Chenoweth ◽  
Glenn Kubiak
Keyword(s):  
Ultraviolet Light ◽  
Extreme Ultraviolet ◽  
Plasma Source ◽  
Gas Jet ◽  
Jet Plasma ◽  
Extreme Ultraviolet Light
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