Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition

2020 ◽  
Vol 38 (3) ◽  
pp. 032408 ◽  
Author(s):  
Masaki Hirayama ◽  
Akinobu Teramoto ◽  
Shigetoshi Sugawa
Keyword(s):  
Atomic Layer Deposition ◽  
Inductively Coupled Plasma ◽  
Plasma Reactor ◽  
Atomic Layer ◽  
Ion Flux ◽  
Ion Energy ◽  
Inductively Coupled ◽  
Layer Deposition ◽  
Inductively Coupled Plasma Reactor ◽  
Interfacial Mixing

scholarly journals Inductively coupled plasma nanoetching of atomic layer deposition alumina

2018 ◽  
Vol 193 ◽  
pp. 28-33 ◽  
Author(s):  
Anpan Han ◽  
Bingdong Chang ◽  
Matteo Todeschini ◽  
Hoa Thanh Le ◽  
William Tiddi ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Inductively Coupled Plasma ◽  
Atomic Layer ◽  
Inductively Coupled ◽  
Layer Deposition
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