scholarly journals High density plasma deposition of device quality silicon nitride. II. Effects of thickness on the electrical properties

1999 ◽  
Vol 17 (4) ◽  
pp. 1430 ◽  
Author(s):  
M. C. Hugon ◽  
F. Delmotte ◽  
B. Agius ◽  
E. A. Irene
Keyword(s):  
Silicon Nitride ◽  
Electrical Properties ◽  
Plasma Deposition ◽  
High Density ◽  
Density Plasma

Reliability of silicon nitride gate dielectrics grown at 400 °C formed by microwave-excited high-density plasma

2003 ◽  
Vol 216 (1-4) ◽  
pp. 246-251 ◽  
Author(s):  
Ichiro Ohshima ◽  
Weitao Cheng ◽  
Yasuhiro Ono ◽  
Masaaki Higuchi ◽  
Masaki Hirayama ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Gate Dielectrics ◽  
High Density ◽  
Density Plasma

Electrical Properties of Silicon Nitride Using High Density and Low Plasma Damage PECVD Formed at 400 C

2012 ◽  
Vol 45 (3) ◽  
pp. 421-428 ◽  
Author(s):  
Y. Nakao ◽  
A. Teramoto ◽  
T. Watanabe ◽  
R. Kuroda ◽  
T. Suwa ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Electrical Properties ◽  
High Density ◽  
Plasma Damage

scholarly journals Modeling high-density-plasma deposition of SiO{sub 2} in SiH{sub 4}/O{sub 2}/Ar

1997 ◽  
Author(s):  
E. Meeks ◽  
R.S. Larson ◽  
P. Ho ◽  
C. Apblett ◽  
S.M. Han ◽  
...  
Keyword(s):  
Plasma Deposition ◽  
High Density ◽  
Density Plasma

Hard boron–suboxide-based films deposited in a sputter-sourced, high-density plasma deposition system

1997 ◽  
Vol 15 (5) ◽  
pp. 2623-2626 ◽  
Author(s):  
C. Doughty ◽  
S. M. Gorbatkin ◽  
T. Y. Tsui ◽  
G. M. Pharr ◽  
D. L. Medlin
Keyword(s):  
Plasma Deposition ◽  
High Density ◽  
Boron Suboxide ◽  
Density Plasma
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