Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique

1999 ◽  
Vol 17 (6) ◽  
pp. 3345 ◽  
Author(s):  
Bing Lu ◽  
James W. Taylor ◽  
Franco Cerrina ◽  
Choi Pheng Soo ◽  
Antony J. Bourdillon
Keyword(s):  
Imaging Technique ◽  
Acid Diffusion ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Effect of Acid Diffusion on Resolution of a Chemically Amplified Resist in X-Ray Lithography

1991 ◽  
Vol 30 (Part 1, No. 10) ◽  
pp. 2619-2625 ◽  
Author(s):  
Jiro Nakamura ◽  
Hiroshi Ban ◽  
Kimiyoshi Deguchi ◽  
Akinobu Tanaka
Keyword(s):  
X Ray ◽  
Acid Diffusion ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Chemically amplified resist technology for i-line applications

1998 ◽  
Author(s):  
Medhat A. Toukhy ◽  
Sanjay Malik ◽  
Andrew J. Blakeney ◽  
Karin R. Schlicht
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist

Characterizing acid diffusion lengths in chemically amplified resists from measurements of deprotection kinetics

2014 ◽  
Vol 13 (4) ◽  
pp. 043017 ◽  
Author(s):  
Abhijit A. Patil ◽  
Yogendra Narayan Pandey ◽  
Manolis Doxastakis ◽  
Gila E. Stein
Keyword(s):  
Acid Diffusion ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Sub-150-nm electron-beam lithography using AZPN114 chemically amplified resist

1997 ◽  
Author(s):  
Zheng Cui ◽  
R. A. Moody ◽  
Ian M. Loader ◽  
John G. Watson ◽  
Philip D. Prewett
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resist
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