Determination of acid diffusion rate in a chemically amplified resist with scanning tunneling microscope lithography

Author(s):  
F. Keith Perkins
2010 ◽  
Vol 104 (17) ◽  
Author(s):  
Matthew J. Comstock ◽  
David A. Strubbe ◽  
Luis Berbil-Bautista ◽  
Niv Levy ◽  
Jongweon Cho ◽  
...  

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