Determination of spot size and acid diffusion length in positive chemically amplified resist for e-beam lithography at 100 and 5 kV

Florian Delachat; Christophe Constancias; Jérôme Reche; Bernard Dal'Zotto; Laurent Pain; Boris Le Drogoff; Mohamed Chaker; Joëlle Margot

doi:10.1116/1.4900730

Determination of spot size and acid diffusion length in positive chemically amplified resist for e-beam lithography at 100 and 5 kV

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.4900730 ◽

2014 ◽

Vol 32 (6) ◽

pp. 06FJ02 ◽

Cited By ~ 4

Author(s):

Florian Delachat ◽

Christophe Constancias ◽

Jérôme Reche ◽

Bernard Dal'Zotto ◽

Laurent Pain ◽

...

Keyword(s):

Diffusion Length ◽

Spot Size ◽

Acid Diffusion ◽

Chemically Amplified ◽

Chemically Amplified Resist

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Determination of acid diffusion rate in a chemically amplified resist with scanning tunneling microscope lithography

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586632 ◽

1993 ◽

Vol 11 (6) ◽

pp. 2597 ◽

Cited By ~ 13

Author(s):

F. Keith Perkins

Keyword(s):

Scanning Tunneling Microscope ◽

Diffusion Rate ◽

Scanning Tunneling ◽

Tunneling Microscope ◽

Acid Diffusion ◽

Chemically Amplified ◽

Chemically Amplified Resist

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Theoretical Study on Acid Diffusion Length in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography

Japanese Journal of Applied Physics ◽

10.7567/jjap.52.016501 ◽

2013 ◽

Vol 52 (1R) ◽

pp. 016501 ◽

Cited By ~ 3

Author(s):

Takahiro Kozawa

Keyword(s):

Theoretical Study ◽

Diffusion Length ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Acid Diffusion ◽

Chemically Amplified ◽

Chemically Amplified Resists

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Acid diffusion length in contact hole imaging of chemically amplified extreme ultraviolet resists

Japanese Journal of Applied Physics ◽

10.7567/jjap.53.016503 ◽

2013 ◽

Vol 53 (1) ◽

pp. 016503 ◽

Cited By ~ 1

Author(s):

Takahiro Kozawa ◽

Taku Hirayama

Keyword(s):

Diffusion Length ◽

Extreme Ultraviolet ◽

Acid Diffusion ◽

Chemically Amplified

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Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.591009 ◽

1999 ◽

Vol 17 (6) ◽

pp. 3345 ◽

Cited By ~ 18

Author(s):

Bing Lu ◽

James W. Taylor ◽

Franco Cerrina ◽

Choi Pheng Soo ◽

Antony J. Bourdillon

Keyword(s):

Imaging Technique ◽

Acid Diffusion ◽

Chemically Amplified ◽

Chemically Amplified Resist

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Effect of spot size on the determination of the diffusion length of minority carriers in p−n junctions using scanned light- or electron-beam techniques

Solid-State Electronics ◽

10.1016/0038-1101(74)90085-9 ◽

1974 ◽

Vol 17 (5) ◽

pp. 510-512 ◽

Cited By ~ 7

Author(s):

Gabriel Lengyel

Keyword(s):

Electron Beam ◽

Diffusion Length ◽

Spot Size ◽

Minority Carriers

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Evaluation of acid diffusion in chemically amplified resist using interdigitated array electrode.

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.6.31 ◽

1993 ◽

Vol 6 (1) ◽

pp. 31-38 ◽

Cited By ~ 1

Author(s):

Jiro NAKAMURA ◽

Hiroshi BAN ◽

Akinobu TANAKA

Keyword(s):

Acid Diffusion ◽

Chemically Amplified ◽

Array Electrode ◽

Chemically Amplified Resist ◽

Interdigitated Array ◽

Interdigitated Array Electrode

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Acid diffusion, standing waves, and information theory: a molecular-scale model of chemically amplified resist

10.1117/12.59728 ◽

1992 ◽

Cited By ~ 1

Author(s):

Peter Trefonas III ◽

Mary T. Allen

Keyword(s):

Information Theory ◽

Standing Waves ◽

Scale Model ◽

Acid Diffusion ◽

Chemically Amplified ◽

Chemically Amplified Resist ◽

Molecular Scale

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Effect of Acid Diffusion on Resolution of a Chemically Amplified Resist in X-Ray Lithography

Japanese Journal of Applied Physics ◽

10.1143/jjap.30.2619 ◽

1991 ◽

Vol 30 (Part 1, No. 10) ◽

pp. 2619-2625 ◽

Cited By ~ 52

Author(s):

Jiro Nakamura ◽

Hiroshi Ban ◽

Kimiyoshi Deguchi ◽

Akinobu Tanaka

Keyword(s):

X Ray ◽

Acid Diffusion ◽

Chemically Amplified ◽

Chemically Amplified Resist

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Determination of acid diffusion and energy deposition parameters by point e-beam exposure in chemically amplified resists

Microelectronic Engineering ◽

10.1016/0167-9317(95)00249-9 ◽

1996 ◽

Vol 30 (1-4) ◽

pp. 295-299 ◽

Cited By ~ 13

Author(s):

I. Raptis ◽

L. Grella ◽

P. Argits ◽

M. Gentili ◽

N. Glezos ◽

...

Keyword(s):

Energy Deposition ◽

Acid Diffusion ◽

Chemically Amplified ◽

Deposition Parameters ◽

Chemically Amplified Resists

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Characterization of acid diffusion for a negative chemically amplified resist using X-ray proximity lithography

Microelectronic Engineering ◽

10.1016/s0167-9317(98)00069-0 ◽

1998 ◽

Vol 41-42 ◽

pp. 301-304 ◽

Cited By ~ 1

Author(s):

Bo K. Choi ◽

J.S. Yang ◽

K.H. Lee ◽

Ohuun Kim

Keyword(s):

X Ray ◽

Acid Diffusion ◽

Chemically Amplified ◽

Chemically Amplified Resist

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