Generating ∼90 nanometer features using near-field contact-mode photolithography with an elastomeric phase mask
1998 ◽
Vol 16
(1)
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pp. 59
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1997 ◽
Vol 35
(1-4)
◽
pp. 345-348
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2006 ◽
Vol 6
(11)
◽
pp. 3647-3651
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Keyword(s):
2021 ◽