Generating ∼90 nanometer features using near-field contact-mode photolithography with an elastomeric phase mask

Author(s):  
John A. Rogers
Keyword(s):  
1997 ◽  
Vol 35 (1-4) ◽  
pp. 345-348 ◽  
Author(s):  
X. Liu ◽  
J.S. Aitchison ◽  
R.M. De La Rue ◽  
S. Thoms ◽  
L. Zhang ◽  
...  

2006 ◽  
Vol 6 (11) ◽  
pp. 3647-3651 ◽  
Author(s):  
Sangjin Kwon ◽  
Youngmo Jeong ◽  
Sungho Jeong

The uniformity and reproducibility of the photoresist nanopatterns fabricated using near-field scanning optical nanolithography (NSOL) are investigated. The nanopatterns could be used as nanomasks for pattern transfer on a silicon wafer. In the NSOL process, uniform patterning with high reproducibility is essential for reliable transfer of the mask patterns on a silicon substrate. Using an aperture type cantilever nanoprobe operated at contact mode and a positive photoresist, various nanopatterns are produced on thin photoresist layer coated on the silicon substrate. The size and shape variations of thereby produced patterns are investigated using atomic force microscope to determine their uniformity and reproducibility. It is demonstrated that the NSOL-produced photoresist nanomasks can be successfully applied for silicon pattern transfer by fabricating a silicon nanochannel array.


1997 ◽  
Vol 70 (20) ◽  
pp. 2658-2660 ◽  
Author(s):  
John A. Rogers ◽  
Kateri E. Paul ◽  
Rebecca J. Jackman ◽  
George M. Whitesides
Keyword(s):  

1999 ◽  
Vol 76 (1-2) ◽  
pp. 13-20 ◽  
Author(s):  
D.A. Lapshin ◽  
V.N. Reshetov ◽  
S.K. Sekatskii ◽  
V.S. Letokhov
Keyword(s):  

1996 ◽  
Vol 68 (17) ◽  
pp. 2337-2339 ◽  
Author(s):  
U. Ben‐Ami ◽  
N. Tessler ◽  
N. Ben‐Ami ◽  
R. Nagar ◽  
G. Fish ◽  
...  

2021 ◽  
Author(s):  
Bo Tong ◽  
Takahiro Hirabayashi ◽  
Yuhki Toku ◽  
Yasuyuki Morita ◽  
Yang Ju

Abstract In this study, a non-contact and quantitative evaluation method was developed to measure the conductivity of metallic nanowires with a nanometer-scale spatial resolution. A coaxial probe was experimentally fabricated; using this probe, microwave images of the Al, Ag, and Cu nanowires and their topography images were simultaneously obtained via microwave atomic force microscopy (M-AFM) in the non-contact mode. A semi-near-field reflection model was established to describe the spatial distribution of a microwave between the tip of the probe and the sample. The local conductivities of metallic nanowires on the nanometer-scale can be quantitatively evaluated in a single scan, using a metal strip substrate to calibrate the reflection signal.


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