Multiple-passband in-fibre Moire resonators fabricated using near-field holography with a chirped phase mask

1997 ◽  
Author(s):  
L.A. Everall
Keyword(s):  
Near Field ◽  
Phase Mask

Electron beam lithography of phase mask gratings for near field holographic production of optical fibre gratings

1997 ◽  
Vol 35 (1-4) ◽  
pp. 345-348 ◽  
Author(s):  
X. Liu ◽  
J.S. Aitchison ◽  
R.M. De La Rue ◽  
S. Thoms ◽  
L. Zhang ◽  
...  
Keyword(s):  
Electron Beam ◽  
Optical Fibre ◽  
Electron Beam Lithography ◽  
Near Field ◽  
Phase Mask

Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field

1997 ◽  
Vol 70 (20) ◽  
pp. 2658-2660 ◽  
Author(s):  
John A. Rogers ◽  
Kateri E. Paul ◽  
Rebecca J. Jackman ◽  
George M. Whitesides
Keyword(s):  
Near Field ◽  
Phase Mask

scholarly journals Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask

2019 ◽  
Vol 26 (5) ◽  
pp. 1782-1789 ◽  
Author(s):  
Dakui Lin ◽  
Zhengkun Liu ◽  
Kay Dietrich ◽  
Andréy Sokolov ◽  
Mewael Giday Sertsu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Near Field ◽  
Central Line ◽  
Stray Light ◽  
Phase Mask ◽  
X Ray ◽  
Density Distributions ◽  
Line Spacing

A fabrication method comprising near-field holography (NFH) with an electron beam lithography (EBL)-written phase mask was developed to fabricate soft X-ray varied-line-spacing gratings (VLSGs). An EBL-written phase mask with an area of 52 mm × 30 mm and a central line density greater than 3000 lines mm−1 was used. The introduction of the EBL-written phase mask substantially simplified the NFH optics for pattern transfer. The characterization of the groove density distribution and diffraction efficiency of the fabricated VLSGs indicates that the EBL–NFH method is feasible and promising for achieving high-accuracy groove density distributions with corresponding image properties. Vertical stray light is suppressed in the soft X-ray spectral range.

Near-field scanning optical microscopy

1986 ◽  
Vol 44 ◽  
pp. 642-643
Author(s):  
E. Betzig ◽  
A. Harootunian ◽  
M. Isaacson ◽  
A. Lewis
Keyword(s):  
Near Field ◽  
Optical Microscope ◽  
Visible Radiation ◽  
Field Methods ◽  
Optical Elements ◽  
Optical Region ◽  
Order Of Magnitude ◽  
Nondestructive Imaging ◽  
Scanning Optical Microscopy ◽  
Near Field Scanning

In general, conventional methods of optical imaging are limited in spatial resolution by either the wavelength of the radiation used or by the aberrations of the optical elements. This is true whether one uses a scanning probe or a fixed beam method. The reason for the wavelength limit of resolution is due to the far field methods of producing or detecting the radiation. If one resorts to restricting our probes to the near field optical region, then the possibility exists of obtaining spatial resolutions more than an order of magnitude smaller than the optical wavelength of the radiation used. In this paper, we will describe the principles underlying such "near field" imaging and present some preliminary results from a near field scanning optical microscope (NS0M) that uses visible radiation and is capable of resolutions comparable to an SEM. The advantage of such a technique is the possibility of completely nondestructive imaging in air at spatial resolutions of about 50nm.

Principles of Planar Near-Field Antenna Measurements

2007 ◽  
Author(s):  
Stuart Gregson ◽  
John McCormick ◽  
Clive Parini
Keyword(s):  
Near Field ◽  
Antenna Measurements
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