Analysis of near-field interference after phase mask for fiber grating fabrication

1996 ◽  
Author(s):  
Qingya Wang ◽  
Yushu Zhang ◽  
Dingsan Gao
Keyword(s):  
Near Field ◽  
Phase Mask ◽  
Fiber Grating ◽  
Grating Fabrication

Chirped Fiber Grating Fabrication Based on Dynamic Phase Mask Method

2017 ◽  
Vol 54 (2) ◽  
pp. 020603
Author(s):  
吕京生 Lü Jingsheng ◽  
宋志强 Song Zhiqiang ◽  
祁海峰 Qi Haifeng ◽  
倪家升 Ni Jiasheng ◽  
王昌 Wang Chang ◽  
...  
Keyword(s):  
Phase Mask ◽  
Fiber Grating ◽  
Grating Fabrication ◽  
Dynamic Phase ◽  
Chirped Fiber Grating

Fabrication of Phase Mask for Optical Fiber Grating

2007 ◽  
Vol 364-366 ◽  
pp. 719-723
Author(s):  
Quan Liu ◽  
Jian Hong Wu ◽  
Ling Ling Fang ◽  
Chao Ming Li
Keyword(s):  
Diffraction Efficiency ◽  
Ion Beam ◽  
Fused Silica ◽  
Phase Mask ◽  
Fiber Grating ◽  
Ion Beam Etching ◽  
First Order ◽  
Silica Substrate ◽  
Order Diffraction ◽  
A New Technique

A fused silica phase mask with the period of 1069nm, and ruled area 50×50mm2 has been fabricated by a new technique, which combines holographic-ion beam etching and reactive ion beam etching. This involves several steps: coating of substrates with controlled thickness of photoresist, formation of a grating mask by holograph interference exposure and development, and finally transferring etching of this mask into the fused silica substrate to form a permanent phase mask. Experimental measurements have shown that the zero order diffraction efficiency is less than 4% and the plus and minus first-order diffraction efficiency is more than 35%. Theoretical analysis has shown that these phase masks can be used for fabricating UV written Fiber Bragg Gratings.

Optimal phase mask for fiber Bragg grating fabrication

1999 ◽  
Vol 17 (11) ◽  
pp. 2366-2370 ◽  
Author(s):  
Y. Qiu ◽  
Y. Sheng ◽  
C. Beaulieu
Keyword(s):  
Fiber Bragg Grating ◽  
Phase Mask ◽  
Bragg Grating ◽  
Grating Fabrication

Electron beam lithography of phase mask gratings for near field holographic production of optical fibre gratings

1997 ◽  
Vol 35 (1-4) ◽  
pp. 345-348 ◽  
Author(s):  
X. Liu ◽  
J.S. Aitchison ◽  
R.M. De La Rue ◽  
S. Thoms ◽  
L. Zhang ◽  
...  
Keyword(s):  
Electron Beam ◽  
Optical Fibre ◽  
Electron Beam Lithography ◽  
Near Field ◽  
Phase Mask
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