Characterization of Uniformity and Reproducibility of Photoresist Nanomasks Fabricated by Near-Field Scanning Optical Nanolithography

2006 ◽  
Vol 6 (11) ◽  
pp. 3647-3651 ◽  
Author(s):  
Sangjin Kwon ◽  
Youngmo Jeong ◽  
Sungho Jeong
Keyword(s):  
Silicon Substrate ◽  
Near Field ◽  
Pattern Transfer ◽  
Contact Mode ◽  
Positive Photoresist ◽  
Atomic Force ◽  
Optical Nanolithography ◽  
Nanochannel Array ◽  
Near Field Scanning

The uniformity and reproducibility of the photoresist nanopatterns fabricated using near-field scanning optical nanolithography (NSOL) are investigated. The nanopatterns could be used as nanomasks for pattern transfer on a silicon wafer. In the NSOL process, uniform patterning with high reproducibility is essential for reliable transfer of the mask patterns on a silicon substrate. Using an aperture type cantilever nanoprobe operated at contact mode and a positive photoresist, various nanopatterns are produced on thin photoresist layer coated on the silicon substrate. The size and shape variations of thereby produced patterns are investigated using atomic force microscope to determine their uniformity and reproducibility. It is demonstrated that the NSOL-produced photoresist nanomasks can be successfully applied for silicon pattern transfer by fabricating a silicon nanochannel array.

Fabrication and Characterization of Evanescent Microwave Probes Compatible With Atomic Force Microscope for Scanning Near-Field Microscopy

2002 ◽  
Author(s):  
Yaqiang Wang ◽  
Massood Tabib-Azar
Keyword(s):  
Atomic Force Microscope ◽  
Near Field ◽  
Planar Waveguides ◽  
Surface Measurement ◽  
Microwave Measurement ◽  
Contact Mode ◽  
Atomic Force ◽  
Afm Imaging ◽  
Microwave Probes

The design and microfabrication of silicon co-axial evanescent microwave probes (EMP) compatible with atomic force microscope (AFM) imaging was discussed. Scanning EMP (SEMP) imaging is suitable for nondestructive surface and subsurface characterization of materials over a wide frequency range-between 0.1 GHz and 140 GHz. The microfabricated EMP consists of a silicon V-shaped cantilever beam, a co-axial tip, and aluminum co-planar waveguides. The coaxial tip has an apex radius of ∼80 Å. The tip itself is oxidation-sharpened heavily-doped silicon surrounded by an oxide layer that acts as insulator and covered with an aluminum co-axial layer. The tip apex is electrically connected to a strip of aluminum that forms the active part of the waveguide. The design and microfabrication procedure are described. Mechanical and electrical characterizations are discussed. Contact mode and SEMP surface measurement results are reported. The first ever simultaneous contact AFM and scanning near-field microwave microscopy (SNMM) surface imaging are presented. Using the microwave measurement along with the AFM imaging opens up a new window to see inside the materials and sets the stage for hyperspectral imaging of organelles of biological objects as well as electronic devices and structural materials.

scholarly journals Characterization of power induced heating and damage in fiber optic probes for near-field scanning optical microscopy

2007 ◽  
Vol 78 (5) ◽  
pp. 053712 ◽  
Author(s):  
Nicholas E. Dickenson ◽  
Elizabeth S. Erickson ◽  
Olivia L. Mooren ◽  
Robert C. Dunn
Keyword(s):  
Optical Microscopy ◽  
Fiber Optic ◽  
Near Field ◽  
Fiber Optic Probes ◽  
Scanning Optical Microscopy ◽  
Near Field Scanning

Characterization of a 90° waveguide bend using near-field scanning optical microscopy

2005 ◽  
Vol 87 (19) ◽  
pp. 191107 ◽  
Author(s):  
Guangwei Yuan ◽  
Kevin L. Lear ◽  
Matthew D. Stephens ◽  
David S. Dandy
Keyword(s):  
Optical Microscopy ◽  
Near Field ◽  
Scanning Optical Microscopy ◽  
Near Field Scanning ◽  
Waveguide Bend
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