Polysilicon gate etching in high density plasmas. IV. Comparison of photoresist and oxide masked polysilicon etching-thickness determination of gate oxide layers using x-ray photoelectron spectroscopy

1996 ◽  
Vol 14 (6) ◽  
pp. 3473 ◽  
Author(s):  
F. H. Bell
Keyword(s):  
Photoelectron Spectroscopy ◽  
Gate Oxide ◽  
High Density ◽  
Oxide Layers ◽  
X Ray ◽  
Thickness Determination ◽  
Polysilicon Gate

Determination of the Thickness of Sio2-Layers on Si by X-Ray Analysis and by X-Ray Photoelectron Spectroscopy

1979 ◽  
Vol 23 ◽  
pp. 223-230
Author(s):  
Maria F. Ebel ◽  
H. Ebel ◽  
J. Wernisch
Keyword(s):  
Photoelectron Spectroscopy ◽  
Count Rate ◽  
Silicon Wafers ◽  
Electron Spectrometer ◽  
Si Substrate ◽  
Oxide Layers ◽  
X Ray ◽  
Information Depth ◽  
Pass Through

It is feasible to investigate the thickness of oxide layers on silicon wafers by X-radiation in the 0.1-10 nm thickness range. For example, X-ray photoelectron spectroscopy (XPS) is a well applicable technique, with information depth of a few nm. Fig. 1 presents the principle of this method. An impinging characteristic X-radiation hν (e.g. Al Kα) count rate ejects Si 2p photoelectrons from the Si-substrate (d), with count rate n2, which, on their way to the electron spectrometer, have to pass through the SiOx-interface (c), the SiO2-layer (b) and the contamination overlayer (a), whereas Si 2p photoelectrons ejected from the SiO2-layer, with count rate n2 have just to penetrate the contamination overlayer. The Si 2p electrons originating from the SiOx-interface, for the situation shown in Fig. 1, can be added to the substrate count rate.

Accurate Thickness Determination of Both Thin SiO2on Si and Thin Si on SiO2by Angle-Resolved X-Ray Photoelectron Spectroscopy

1999 ◽  
Vol 38 (Part 1, No. 7A) ◽  
pp. 4172-4179 ◽  
Author(s):  
Toshiharu Katayama ◽  
Hidekazu Yamamoto ◽  
Masahiko Ikeno ◽  
Yoji Mashiko ◽  
Satoru Kawazu ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
X Ray ◽  
Thickness Determination

scholarly journals Enhanced Water Resistance of Recycled Newspaper/High Density Polyethylene Composite Laminates via Hydrophobic Modification of Newspaper Laminas

Polymers ◽  
2021 ◽  
Vol 13 (3) ◽  
pp. 421
Author(s):  
Binwei Zheng ◽  
Weiwei Zhang ◽  
Litao Guan ◽  
Jin Gu ◽  
Dengyun Tu ◽  
...  
Keyword(s):  
Stearic Acid ◽  
Photoelectron Spectroscopy ◽  
Composite Laminates ◽  
High Density Polyethylene ◽  
Water Resistance ◽  
Laminated Composite ◽  
High Strength ◽  
High Water ◽  
High Density ◽  
X Ray

A high strength recycled newspaper (NP)/high density polyethylene (HDPE) laminated composite was developed using NP laminas as reinforcement and HDPE film as matrix. Herein, NP fiber was modified with stearic acid (SA) to enhance the water resistance of the NP laminas and NP/HDPE composite. The effects of heat treatment and SA concentration on the water resistance and tensile property of NP and composite samples were investigated. The chemical structure of the NP was characterized with X-ray diffractometer, X-ray photoelectron spectroscopy and attenuated total reflectance Fourier transform infrared spectra techniques. The surface and microstructure of the NP sheets were observed by scanning electron microscopy. An expected high-water resistance of NP sheets was achieved due to a chemical bonding that low surface energy SA were grafted onto the modified NP fibers. Results showed that the hydrophobicity of NP increased with increasing the stearic acid concentration. The water resistance of the composite laminates was depended on the hydrophobicity of the NP sheets. The lowest value of 2 h water absorption rate (3.3% ± 0.3%) and thickness swelling rate (2.2% ± 0.4%) of composite were obtained when the SA concentration was 0.15 M. In addition, the introduction of SA can not only enhance the water resistance of the composite laminates, but also reduce the loss of tensile strength in wet conditions, which shows potential in outdoor applications.

scholarly journals An Insight into Chemistry and Structure of Colloidal 2D-WS2 Nanoflakes: Combined XPS and XRD Study

Nanomaterials ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 1969
Author(s):  
Riccardo Scarfiello ◽  
Elisabetta Mazzotta ◽  
Davide Altamura ◽  
Concetta Nobile ◽  
Rosanna Mastria ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Xrd Analysis ◽  
Crystal Habit ◽  
Phase Identification ◽  
X Ray Diffraction ◽  
X Ray ◽  
Morphological Evaluation ◽  
Rational Understanding ◽  
Structural Inspection

The surface and structural characterization techniques of three atom-thick bi-dimensional 2D-WS2 colloidal nanocrystals cross the limit of bulk investigation, offering the possibility of simultaneous phase identification, structural-to-morphological evaluation, and surface chemical description. In the present study, we report a rational understanding based on X-ray photoelectron spectroscopy (XPS) and structural inspection of two kinds of dimensionally controllable 2D-WS2 colloidal nanoflakes (NFLs) generated with a surfactant assisted non-hydrolytic route. The qualitative and quantitative determination of 1T’ and 2H phases based on W 4f XPS signal components, together with the presence of two kinds of sulfur ions, S22− and S2−, based on S 2p signal and related to the formation of WS2 and WOxSy in a mixed oxygen-sulfur environment, are carefully reported and discussed for both nanocrystals breeds. The XPS results are used as an input for detailed X-ray Diffraction (XRD) analysis allowing for a clear discrimination of NFLs crystal habit, and an estimation of the exact number of atomic monolayers composing the 2D-WS2 nanocrystalline samples.

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