Comparison of advanced plasma sources for etching applications. III. Ion energy distribution functions for a helicon and a multipole electron cyclotron resonance source
1994 ◽
Vol 12
(4)
◽
pp. 2333
◽
1999 ◽
Vol 38
(Part 1, No. 7B)
◽
pp. 4393-4396
◽
1992 ◽
Vol 10
(5)
◽
pp. 3114-3118
◽
1993 ◽
Vol 32
(Part 1, No. 10)
◽
pp. 4756-4760
2005 ◽
Vol 200
(1-4)
◽
pp. 835-840
◽
2015 ◽
Vol 33
(6)
◽
pp. 061301
◽
1998 ◽
Vol 16
(6)
◽
pp. 3389-3395
◽
2019 ◽
Vol 28
(2)
◽
pp. 025010
◽
1983 ◽
Vol 22
(Part 1, No. 2)
◽
pp. 315-318
◽