Comparison of advanced plasma sources for etching applications. III. Ion energy distribution functions for a helicon and a multipole electron cyclotron resonance source

Author(s):  
G. W. Gibson
1993 ◽  
Vol 32 (Part 1, No. 10) ◽  
pp. 4756-4760
Author(s):  
Yoshifumi Saitou ◽  
Yoshiharu Nakamura ◽  
Masayoshi Tanaka ◽  
Akio Komori ◽  
Yoshinobu Kawai

1983 ◽  
Vol 22 (Part 1, No. 2) ◽  
pp. 315-318 ◽  
Author(s):  
Kazuo Nakamura ◽  
Takemichi Satoh ◽  
Kazuo Toi ◽  
Naoji Hiraki ◽  
Yukio Nakamura ◽  
...  

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