Characterization of near-field holography grating masks for optoelectronics fabricated by electron beam lithography

1992 ◽  
Vol 10 (6) ◽  
pp. 2530 ◽  
Author(s):  
D. M. Tennant
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Near Field

scholarly journals Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask

2019 ◽  
Vol 26 (5) ◽  
pp. 1782-1789 ◽  
Author(s):  
Dakui Lin ◽  
Zhengkun Liu ◽  
Kay Dietrich ◽  
Andréy Sokolov ◽  
Mewael Giday Sertsu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Near Field ◽  
Central Line ◽  
Stray Light ◽  
Phase Mask ◽  
X Ray ◽  
Density Distributions ◽  
Line Spacing

A fabrication method comprising near-field holography (NFH) with an electron beam lithography (EBL)-written phase mask was developed to fabricate soft X-ray varied-line-spacing gratings (VLSGs). An EBL-written phase mask with an area of 52 mm × 30 mm and a central line density greater than 3000 lines mm−1 was used. The introduction of the EBL-written phase mask substantially simplified the NFH optics for pattern transfer. The characterization of the groove density distribution and diffraction efficiency of the fabricated VLSGs indicates that the EBL–NFH method is feasible and promising for achieving high-accuracy groove density distributions with corresponding image properties. Vertical stray light is suppressed in the soft X-ray spectral range.

Design of soft x-ray varied-line-spacing grating based on electron beam lithography-near field lithography

2016 ◽  
Author(s):  
Dakui Lin ◽  
Huoyao Chen ◽  
Stefanie Kroker ◽  
Thomas Käsebier ◽  
Zhengkun Liu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Near Field ◽  
X Ray ◽  
Line Spacing

Electron beam lithography of phase mask gratings for near field holographic production of optical fibre gratings

1997 ◽  
Vol 35 (1-4) ◽  
pp. 345-348 ◽  
Author(s):  
X. Liu ◽  
J.S. Aitchison ◽  
R.M. De La Rue ◽  
S. Thoms ◽  
L. Zhang ◽  
...  
Keyword(s):  
Electron Beam ◽  
Optical Fibre ◽  
Electron Beam Lithography ◽  
Near Field ◽  
Phase Mask

Characterization of High Resolution Resists and Metal Shims by Scanning Probe Microscopy

2000 ◽  
Vol 6 (2) ◽  
pp. 129-136 ◽  
Author(s):  
B. A. Sexton ◽  
R. J. Marnock
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Scanning Probe Microscopy ◽  
Electron Beam Lithography ◽  
Scanning Probe ◽  
Feedback Process ◽  
Probe Microscope ◽  
Etched Silicon ◽  
Micro Patterns

Technologies such as compact disc (CD) manufacturing, hologram embossing, and security printing rely on the reproduction of micro-patterns generated on surfaces by optical or electron-beam lithographic writing onto electron-beam or photoresists. The periodicity of such patterns varies from sub-micron to several microns, with depths up to 0.5 μm. The scanning probe microscope (SPM) is becoming a routine tool for analysis of these micro-patterns, to check on depths and lateral dimensions of features. Direct scanning of resist-covered plates is now possible, without damage, using resonant low-contact force SPM with etched silicon cantilevers. Metal shims produced from the master resist plates can also be scanned and checked for defects prior to production of embossed foils. The present article discusses examples of the use of a Digital Instruments 3100 microscope in analysis of production electron-beam lithography plates with a 0.5 μm resist thickness. We also examine features of nickel replicas (father and mother shims) produced by electroforming from the original plate. With SPM measurements of the development profile of a particular plate, corrections can be made to exposures and development times during production to correct errors. An example is given of such a feedback process.

Sign in / Sign up

Export Citation Format

Share Document