Characterization of plasma enhanced chemical vapor deposited SiC and its application in advanced reticle technology–scattering with angular limitation in projection electron beam lithography membrane

2000 ◽  
Vol 18 (4) ◽  
pp. 1225-1229 ◽  
Author(s):  
S.-I. Han ◽  
P. J. S. Mangat ◽  
S. M. Smith ◽  
W. J. Dauksher ◽  
D. Convey ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Chemical Vapor ◽  
Chemical Vapor Deposited

Micropatterning of Chemical-Vapor-Deposited Diamond Films in Electron Beam Lithography

2000 ◽  
Vol 39 (Part 1, No. 7B) ◽  
pp. 4532-4535 ◽  
Author(s):  
Shuji Kiyohara ◽  
Kenjiro Ayano ◽  
Takahisa Abe ◽  
Katsumi Mori
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Chemical Vapor Deposited

Characterization of Low Temperature Chemical Vapor Deposited Gd2O3 Doped CeO2 Films

2011 ◽  
Vol 485 ◽  
pp. 133-136 ◽  
Author(s):  
Ryoichi Saotome ◽  
Naoki Wakiya ◽  
Takanori Kiguchi ◽  
Jeffrey S. Cross ◽  
Osamu Sakurai ◽  
...  
Keyword(s):  
Activation Energy ◽  
Vapor Deposition ◽  
Electrochemical Impedance ◽  
Pulsed Laser ◽  
Chemical Vapor ◽  
Partial Pressures ◽  
Chemical Vapor Deposited ◽  
Electrical Conductivities ◽  
Deposited Films

Highly oriented and polycrystalline Gd2O3 doped CeO2 thin films were prepared on α-Al2O3(0001) substrates by chemical vapor deposition, using Ce(C5H4C2H5)3 and Gd(C5H4C2H5)3 as precursors. The compositions of the films were controlled by optimizing the vaporization pressure of Gd precursor under the constant vaporization condition of Ce precursor. In-plane electrical conductivities of the films at various temperatures and oxygen partial pressures were evaluated by electrochemical impedance spectroscopy measurements. The activation energy of the film was determined as 0.94 eV, which is comparable with that of pulsed laser deposited films.

Characterization of reduced pressure chemical vapor deposited Si0.8Ge0.2/Si multi-layers

2013 ◽  
Vol 16 (1) ◽  
pp. 126-130 ◽  
Author(s):  
Kyu-Hwan Shim ◽  
Hyeon Deok Yang ◽  
Yeon-Ho Kil ◽  
Jong-Han Yang ◽  
Woong-Ki Hong ◽  
...  
Keyword(s):  
Chemical Vapor ◽  
Reduced Pressure ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical

Fabrication and characterization of microwave-plasma-assisted chemical-vapor-deposited dielectric coatings

1991 ◽  
Author(s):  
Roger M. Wood ◽  
Adrian C. Greenham ◽  
Bruce A. Nichols ◽  
Noorallah Nourshargh ◽  
Keith L. Lewis
Keyword(s):  
Microwave Plasma ◽  
Chemical Vapor ◽  
Dielectric Coatings ◽  
Chemical Vapor Deposited ◽  
Fabrication And Characterization
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