Synthesis and characterization of calixarene derivatives as resist materials for electron-beam lithography

2006 ◽  
Vol 24 (1) ◽  
pp. 267 ◽  
Author(s):  
Mirwais Aktary ◽  
Kenneth L. Westra ◽  
Mark R. Freeman ◽  
Yasutaka Tanaka
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Synthesis And Characterization

Electron-Beam-Induced Synthesis and Characterization of W18O49Nanowires

2008 ◽  
Vol 112 (15) ◽  
pp. 5856-5859 ◽  
Author(s):  
Guozhen Shen ◽  
Yoshio Bando ◽  
Dmitri Golberg ◽  
Chongwu Zhou
Keyword(s):  
Electron Beam ◽  
Synthesis And Characterization

Synthesis and characterization of electron beam evaporated LiCoO2 thin films

Ionics ◽  
2007 ◽  
Vol 13 (6) ◽  
pp. 473-477 ◽  
Author(s):  
V. Kalai Vani ◽  
O. M. Hussain
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Synthesis And Characterization

Characterization of High Resolution Resists and Metal Shims by Scanning Probe Microscopy

2000 ◽  
Vol 6 (2) ◽  
pp. 129-136 ◽  
Author(s):  
B. A. Sexton ◽  
R. J. Marnock
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Scanning Probe Microscopy ◽  
Electron Beam Lithography ◽  
Scanning Probe ◽  
Feedback Process ◽  
Probe Microscope ◽  
Etched Silicon ◽  
Micro Patterns

Technologies such as compact disc (CD) manufacturing, hologram embossing, and security printing rely on the reproduction of micro-patterns generated on surfaces by optical or electron-beam lithographic writing onto electron-beam or photoresists. The periodicity of such patterns varies from sub-micron to several microns, with depths up to 0.5 μm. The scanning probe microscope (SPM) is becoming a routine tool for analysis of these micro-patterns, to check on depths and lateral dimensions of features. Direct scanning of resist-covered plates is now possible, without damage, using resonant low-contact force SPM with etched silicon cantilevers. Metal shims produced from the master resist plates can also be scanned and checked for defects prior to production of embossed foils. The present article discusses examples of the use of a Digital Instruments 3100 microscope in analysis of production electron-beam lithography plates with a 0.5 μm resist thickness. We also examine features of nickel replicas (father and mother shims) produced by electroforming from the original plate. With SPM measurements of the development profile of a particular plate, corrections can be made to exposures and development times during production to correct errors. An example is given of such a feedback process.

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