Extreme ultraviolet resist and mirror characterization: Studies with a laser plasma source

1990 ◽  
Vol 8 (6) ◽  
pp. 1643 ◽  
Author(s):  
Glenn D. Kubiak
Keyword(s):  
Laser Plasma ◽  
Extreme Ultraviolet ◽  
Plasma Source ◽  
Characterization Studies

Extreme Ultraviolet Spectroscopy of a Laser Plasma Source for Lithography

1998 ◽  
Vol 57 (2) ◽  
pp. 276-282 ◽  
Author(s):  
A P Shevelko ◽  
L A Shmaenok ◽  
S S Churilov ◽  
R K F J Bastiaensen ◽  
F Bijkerk
Keyword(s):  
Laser Plasma ◽  
Extreme Ultraviolet ◽  
Plasma Source ◽  
Ultraviolet Spectroscopy

scholarly journals Эмиссионные свойства лазерной плазмы при ее возбуждении на молекулярно-кластерных струях углекислоты

2019 ◽  
Vol 89 (11) ◽  
pp. 1656
Author(s):  
А.Н. Нечай ◽  
А.А. Перекалов ◽  
Н.И. Чхало ◽  
Н.Н. Салащенко
Keyword(s):  
Ultraviolet Radiation ◽  
Laser Plasma ◽  
Radiation Source ◽  
Extreme Ultraviolet ◽  
Supersonic Nozzle ◽  
Plasma Source ◽  
Molecular Cluster ◽  
Gas Jet ◽  
Euv Emission ◽  
Extreme Ultraviolet Radiation

The paper presents the results of studies of a gas-jet laser-plasma source of extreme ultraviolet radiation (EUV) based on a conical supersonic nozzle. Molecular cluster CO2 jets were used as targets. By changing the parameters of the gas at the nozzle entrance, various modes of gas outflow were obtained, the influence of these modes on the emission and technical characteristics of the radiation source was studied. An experimentally shown is an increase in EUV emission with an increase in the amount of clustered matter in the jet. A possible relationship was observed between the increase in the intensity of EUV radiation with an increase in the number of clustered matter in the jet.

Nanoscale Imaging Using a Compact Laser Plasma Source of Soft X-Rays and Extreme Ultraviolet (EUV)

2018 ◽  
pp. 251-260 ◽  
Author(s):  
P. Wachulak ◽  
A. Torrisi ◽  
M. Ayele ◽  
J. Czwartos ◽  
A. Bartnik ◽  
...  
Keyword(s):  
Laser Plasma ◽  
Extreme Ultraviolet ◽  
Plasma Source ◽  
X Rays ◽  
Nanoscale Imaging

Extreme ultraviolet spectroscopy of a laser plasma source for lithography

1997 ◽  
Author(s):  
Fred Bijkerk ◽  
Alexander P. Shevelko ◽  
Leonid A. Shmaenok ◽  
S. S. Churilov
Keyword(s):  
Laser Plasma ◽  
Extreme Ultraviolet ◽  
Plasma Source ◽  
Ultraviolet Spectroscopy
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