scholarly journals High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography

2004 ◽  
Vol 22 (2) ◽  
pp. 785 ◽  
Author(s):  
M. Richardson ◽  
C.-S. Koay ◽  
K. Takenoshita ◽  
C. Keyser ◽  
M. Al-Rabban
Keyword(s):  
Conversion Efficiency ◽  
Laser Plasma ◽  
Extreme Ultraviolet ◽  
Plasma Source ◽  
High Conversion ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
High Conversion Efficiency

High-conversion-efficiency tin material laser-plasma source for EUVL

2003 ◽  
Author(s):  
Chiew-Seng Koay ◽  
Christian K. Keyser ◽  
K. Takenoshita ◽  
Etsuo Fujiwara ◽  
Moza M. Al-Rabban ◽  
...  
Keyword(s):  
Conversion Efficiency ◽  
Laser Plasma ◽  
Plasma Source ◽  
High Conversion ◽  
High Conversion Efficiency

High conversion efficiency microscopic tin-doped droplet target laser-plasma source for EUVL

2005 ◽  
Author(s):  
Chiew-Seng Koay ◽  
Simi George ◽  
Kazutoshi Takenoshita ◽  
Robert Bernath ◽  
Etsuo Fujiwara ◽  
...  
Keyword(s):  
Conversion Efficiency ◽  
Laser Plasma ◽  
Plasma Source ◽  
High Conversion ◽  
High Conversion Efficiency

Dynamics of Mass-Limited Laser Plasma Targets as Sources for Extreme Ultraviolet Lithography

2002 ◽  
Vol 41 (Part 1, No. 6B) ◽  
pp. 4070-4073 ◽  
Author(s):  
Christian Keyser ◽  
Robert Bernath ◽  
Moza Al-Rabban ◽  
Martin Richardson
Keyword(s):  
Laser Plasma ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography
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