A high speed, high precision electron beam lithography system (system design)

1985 ◽  
Vol 3 (1) ◽  
pp. 94 ◽  
Author(s):  
K. Nakamura
Keyword(s):  
Electron Beam ◽  
System Design ◽  
High Precision ◽  
Electron Beam Lithography ◽  
High Speed ◽  
Lithography System

Variably shaped electron beam lithography system, EB55: I. System design

1981 ◽  
Vol 19 (4) ◽  
pp. 941-945 ◽  
Author(s):  
M. Fujinami ◽  
T. Matsuda ◽  
K. Takamoto ◽  
H. Yoda ◽  
T. Ishiga ◽  
...  
Keyword(s):  
Electron Beam ◽  
System Design ◽  
Electron Beam Lithography ◽  
Lithography System

A High Speed Nanometric Electron Beam Lithography System

1987 ◽  
Author(s):  
T. Matsuzaka ◽  
N. Saitou ◽  
M. Okumura ◽  
G. Matsuoka ◽  
M. Ohyama
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
High Speed ◽  
Lithography System
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