Pulse–time‐modulated electron cyclotron resonance plasma discharge for highly selective, highly anisotropic, and charge‐free etching

Seiji Samukawa; Hiroto Ohtake; Tetsu Mieno

doi:10.1116/1.580170

Pulse–time‐modulated electron cyclotron resonance plasma discharge for highly selective, highly anisotropic, and charge‐free etching

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580170 ◽

1996 ◽

Vol 14 (6) ◽

pp. 3049-3058 ◽

Cited By ~ 87

Author(s):

Seiji Samukawa ◽

Hiroto Ohtake ◽

Tetsu Mieno

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Discharge ◽

Electron Cyclotron ◽

Pulse Time ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Pulse-Time Modulated Electron Cyclotron Resonance Plasma Discharge for Precise ULSI Patterning

10.7567/ssdm.1994.a-7-1 ◽

1994 ◽

Author(s):

Seiji Samukawa

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Discharge ◽

Electron Cyclotron ◽

Pulse Time ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Pressure dependent mode transition in an electron cyclotron resonance plasma discharge

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1387053 ◽

2001 ◽

Vol 19 (5) ◽

pp. 2446-2452 ◽

Cited By ~ 18

Author(s):

Ane Aanesland ◽

Åshild Fredriksen

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Discharge ◽

Electron Cyclotron ◽

Mode Transition ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Structural and electrical properties of thin microcrystalline silicon films deposited by an electron cyclotron resonance plasma discharge of 2% SiH4/Ar further diluted in H2

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581481 ◽

1998 ◽

Vol 16 (5) ◽

pp. 2751-2756 ◽

Cited By ~ 11

Author(s):

B. B. Jagannathan ◽

R. L. Wallace ◽

W. A. Anderson

Keyword(s):

Electrical Properties ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Discharge ◽

Electron Cyclotron ◽

Silicon Films ◽

Microcrystalline Silicon ◽

Electron Cyclotron Resonance Plasma ◽

Structural And Electrical Properties ◽

Resonance Plasma

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Pulse‐time‐modulated electron cyclotron resonance plasma etching with low radio‐frequency substrate bias

Applied Physics Letters ◽

10.1063/1.116071 ◽

1996 ◽

Vol 68 (3) ◽

pp. 316-318 ◽

Cited By ~ 41

Author(s):

Seiji Samukawa

Keyword(s):

Radio Frequency ◽

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Substrate Bias ◽

Pulse Time ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Highly Selective and Highly AnisotropicSiO2Etching in Pulse-Time Modulated Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.2133 ◽

1994 ◽

Vol 33 (Part 1, No. 4B) ◽

pp. 2133-2138 ◽

Cited By ~ 63

Author(s):

Seiji Samukawa

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Pulse Time ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Time-Modulated Electron Cyclotron Resonance Plasma Discharge for Controlling the Polymerization in SiO2Etching

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.6080 ◽

1993 ◽

Vol 32 (Part 1, No. 12B) ◽

pp. 6080-6087 ◽

Cited By ~ 28

Author(s):

Seiji Samukawa

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Discharge ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Time‐modulated electron cyclotron resonance plasma discharge for controlling generation of reactive species

Applied Physics Letters ◽

10.1063/1.110586 ◽

1993 ◽

Vol 63 (15) ◽

pp. 2044-2046 ◽

Cited By ~ 84

Author(s):

Seiji Samukawa ◽

Shuichi Furuoya

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Discharge ◽

Reactive Species ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Pulse-time modulated electron cyclotron resonance plasma etching for highly selective, highly anisotropic, and less-charging polycrystalline silicon patterning

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587616 ◽

1994 ◽

Vol 12 (6) ◽

pp. 3300 ◽

Cited By ~ 46

Author(s):

Seiji Samukawa

Keyword(s):

Plasma Etching ◽

Cyclotron Resonance ◽

Polycrystalline Silicon ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Pulse Time ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Preparation of doped hydrogenated amorphous silicon films by microwave electron‐cyclotron‐resonance plasma discharge deposition

Journal of Applied Physics ◽

10.1063/1.338013 ◽

1987 ◽

Vol 61 (5) ◽

pp. 2084-2087 ◽

Cited By ~ 8

Author(s):

M. Kitagawa ◽

K. Setsune ◽

Y. Manabe ◽

T. Hirao

Keyword(s):

Amorphous Silicon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Plasma Discharge ◽

Electron Cyclotron ◽

Silicon Films ◽

Electron Cyclotron Resonance Plasma ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Particle fluxes in an electron cyclotron resonance plasma discharge

Journal of Applied Physics ◽

10.1063/1.1383022 ◽

2001 ◽

Vol 90 (3) ◽

pp. 1124-1129

Author(s):

J. González-Damián ◽

C. Gutiérrez-Tapia

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Discharge ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Particle Fluxes ◽

Resonance Plasma

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