Pulse-time modulated electron cyclotron resonance plasma etching for highly selective, highly anisotropic, and less-charging polycrystalline silicon patterning

Seiji Samukawa

doi:10.1116/1.587616

Pulse-time modulated electron cyclotron resonance plasma etching for highly selective, highly anisotropic, and less-charging polycrystalline silicon patterning

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587616 ◽

1994 ◽

Vol 12 (6) ◽

pp. 3300 ◽

Cited By ~ 46

Author(s):

Seiji Samukawa

Keyword(s):

Plasma Etching ◽

Cyclotron Resonance ◽

Polycrystalline Silicon ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Pulse Time ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Pulse‐time‐modulated electron cyclotron resonance plasma etching for highly selective, highly anisotropic, and notch‐free polycrystalline silicon patterning

Applied Physics Letters ◽

10.1063/1.111290 ◽

1994 ◽

Vol 64 (25) ◽

pp. 3398-3400 ◽

Cited By ~ 57

Author(s):

Seiji Samukawa

Keyword(s):

Plasma Etching ◽

Cyclotron Resonance ◽

Polycrystalline Silicon ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Pulse Time ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Pulse‐time‐modulated electron cyclotron resonance plasma etching with low radio‐frequency substrate bias

Applied Physics Letters ◽

10.1063/1.116071 ◽

1996 ◽

Vol 68 (3) ◽

pp. 316-318 ◽

Cited By ~ 41

Author(s):

Seiji Samukawa

Keyword(s):

Radio Frequency ◽

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Substrate Bias ◽

Pulse Time ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Extremely high‐selective electron cyclotron resonance plasma etching for phosphorus‐doped polycrystalline silicon

Applied Physics Letters ◽

10.1063/1.103649 ◽

1990 ◽

Vol 57 (4) ◽

pp. 403-405 ◽

Cited By ~ 18

Author(s):

Seiji Samukawa ◽

Yasuhiro Suzuki ◽

Masami Sasaki

Keyword(s):

Plasma Etching ◽

Cyclotron Resonance ◽

Polycrystalline Silicon ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Phosphorus Doped ◽

Resonance Plasma

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Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

Applied Physics Letters ◽

10.1063/1.102487 ◽

1990 ◽

Vol 56 (15) ◽

pp. 1424-1426 ◽

Cited By ~ 52

Author(s):

S. J. Pearton ◽

U. K. Chakrabarti ◽

A. P. Kinsella ◽

D. Johnson ◽

C. Constantine

Keyword(s):

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Effects of electron cyclotron resonance plasma thermal oxidation on the properties of polycrystalline silicon film

Applied Physics Letters ◽

10.1063/1.114363 ◽

1995 ◽

Vol 67 (13) ◽

pp. 1880-1882 ◽

Cited By ~ 12

Author(s):

Jung‐Yeal Lee ◽

Chul‐Hi Han ◽

Choong‐Ki Kim ◽

Bok‐Ki Kim

Keyword(s):

Thermal Oxidation ◽

Cyclotron Resonance ◽

Polycrystalline Silicon ◽

Electron Cyclotron Resonance ◽

Silicon Film ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Polycrystalline Silicon Film ◽

Resonance Plasma

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Characteristics of amorphous and polycrystalline silicon films deposited at 120 °C by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581195 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1912-1916 ◽

Cited By ~ 31

Author(s):

Sanghoon Bae ◽

A. Kaan Kalkan ◽

Shangcong Cheng ◽

Stephen J. Fonash

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Polycrystalline Silicon ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Polycrystalline Silicon Films ◽

Resonance Plasma

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ICl/Ar electron cyclotron resonance plasma etching of III–V nitrides

Applied Physics Letters ◽

10.1063/1.117603 ◽

1996 ◽

Vol 69 (10) ◽

pp. 1426-1428 ◽

Cited By ~ 52

Author(s):

C. B. Vartuli ◽

S. J. Pearton ◽

J. W. Lee ◽

J. Hong ◽

J. D. MacKenzie ◽

...

Keyword(s):

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Morphology control of silicon nanotips fabricated by electron cyclotron resonance plasma etching

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.2163894 ◽

2006 ◽

Vol 24 (1) ◽

pp. 308 ◽

Cited By ~ 16

Author(s):

C. H. Hsu ◽

Y. F. Huang ◽

L. C. Chen ◽

S. Chattopadhyay ◽

K. H. Chen ◽

...

Keyword(s):

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Morphology Control ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Ultralow damage depth by electron cyclotron resonance plasma etching of GaAs/InGaAs quantum wells

Applied Physics Letters ◽

10.1063/1.108767 ◽

1993 ◽

Vol 62 (10) ◽

pp. 1137-1139 ◽

Cited By ~ 8

Author(s):

T. Bickl ◽

B. Jacobs ◽

J. Straka ◽

A. Forchel

Keyword(s):

Quantum Wells ◽

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Damage Depth ◽

Resonance Plasma

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Development of a high-selectivity process for electron cyclotron resonance plasma etching of II-VI semiconductors

Journal of Electronic Materials ◽

10.1007/s11664-002-0231-3 ◽

2002 ◽

Vol 31 (7) ◽

pp. 749-753 ◽

Cited By ~ 22

Author(s):

A. J. Stoltz ◽

J. D. Benson ◽

M. thomas ◽

P. R. Boyd ◽

M. Martinka ◽

...

Keyword(s):

Plasma Etching ◽

Cyclotron Resonance ◽

High Selectivity ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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