Fluorocarbon radicals and surface reactions in fluorocarbon high density etching plasma. I. O2 addition to electron cyclotron resonance plasma employing CHF3

1996 ◽  
Vol 14 (4) ◽  
pp. 2004-2010 ◽  
Author(s):  
Kunimasa Takahashi ◽  
Masaru Hori ◽  
Toshio Goto
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Surface Reactions ◽  
Electron Cyclotron ◽  
High Density ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma

Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

1990 ◽  
Vol 56 (15) ◽  
pp. 1424-1426 ◽  
Author(s):  
S. J. Pearton ◽  
U. K. Chakrabarti ◽  
A. P. Kinsella ◽  
D. Johnson ◽  
C. Constantine
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma
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