Low temperature deposition of silicon nitride films by distributed electron cyclotron resonance plasma‐enhanced chemical vapor deposition

S. Sitbon; M. C. Hugon; B. Agius; F. Abel; J. L. Courant; M. Puech

doi:10.1116/1.579609

Low temperature deposition of silicon nitride films by distributed electron cyclotron resonance plasma‐enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579609 ◽

1995 ◽

Vol 13 (6) ◽

pp. 2900-2907 ◽

Cited By ~ 41

Author(s):

S. Sitbon ◽

M. C. Hugon ◽

B. Agius ◽

F. Abel ◽

J. L. Courant ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Silicon Nitride Films ◽

Temperature Deposition ◽

Resonance Plasma

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Electrical properties of silicon nitride films grown on a SiGe layer by distributed electron cyclotron resonance plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(96)09264-4 ◽

1997 ◽

Vol 294 (1-2) ◽

pp. 214-216 ◽

Cited By ~ 1

Author(s):

E Dufour-Gergam ◽

F Meyer ◽

F Delmotte ◽

M.C Hugon ◽

B Agius ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Electrical Properties ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Sige Layer ◽

Silicon Nitride Films ◽

Resonance Plasma

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Low Temperature Deposition of SiO2 by Distributed Electron Cyclotron Resonance Plasma‐Enhanced Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2069437 ◽

1992 ◽

Vol 139 (5) ◽

pp. 1489-1495 ◽

Cited By ~ 29

Author(s):

F. Plais ◽

B. Agius ◽

F. Abel ◽

J. Siejka ◽

M. Puech ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Temperature Deposition ◽

Resonance Plasma

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ChemInform Abstract: Low Temperature Deposition of SiO2 by Distributed Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition.

ChemInform ◽

10.1002/chin.199230253 ◽

2010 ◽

Vol 23 (30) ◽

pp. no-no

Author(s):

F. PLAIS ◽

B. AGIUS ◽

F. ABEL ◽

J. SIEJKA ◽

M. PUECH ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Temperature Deposition ◽

Resonance Plasma

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Low Temperature Deposition of(Ba,Sr)TiO3Films by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.35.5089 ◽

1996 ◽

Vol 35 (Part 1, No. 9B) ◽

pp. 5089-5093 ◽

Cited By ~ 15

Author(s):

Shuji Sone ◽

Hisato Yabuta ◽

Yoshitake Kato ◽

Toshihiro Iizuka ◽

Shintaro Yamamichi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Temperature Deposition ◽

Resonance Plasma

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Low‐temperature homoepitaxial growth of Si by electron cyclotron resonance plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.114962 ◽

1995 ◽

Vol 67 (7) ◽

pp. 971-973 ◽

Cited By ~ 21

Author(s):

J. L. Rogers ◽

P. S. Andry ◽

W. J. Varhue ◽

P. McGaughnea ◽

E. Adams ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Homoepitaxial Growth ◽

Resonance Plasma

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Low temperature epitaxial growth of Ge using electron‐cyclotron‐resonance plasma‐assisted chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.351189 ◽

1992 ◽

Vol 71 (4) ◽

pp. 1949-1954 ◽

Cited By ~ 3

Author(s):

W. J. Varhue ◽

J. M. Carulli ◽

G. G. Peterson ◽

J. A. Miller

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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I‐Vcharacteristics of electron‐cyclotron‐resonance plasma‐enhanced chemical‐vapor‐deposition silicon nitride thin films

Journal of Applied Physics ◽

10.1063/1.356455 ◽

1994 ◽

Vol 75 (2) ◽

pp. 979-984 ◽

Cited By ~ 26

Author(s):

Yoo‐Chan Jeon ◽

Ho‐Young Lee ◽

Seung‐Ki Joo

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Low‐Temperature Si Epitaxial Growth by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2069532 ◽

1992 ◽

Vol 139 (7) ◽

pp. 1983-1988 ◽

Cited By ~ 3

Author(s):

Naoki Kasai ◽

Nobuhiro Endo

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.22.l210 ◽

1983 ◽

Vol 22 (Part 2, No. 4) ◽

pp. L210-L212 ◽

Cited By ~ 289

Author(s):

Seitaro Matsuo ◽

Mikiho Kiuchi

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Resonance Plasma

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Low Temperature Nucleation of the Perovskite Phase in the Deposition of Pb(Zr,Ti)O 3 Films on the Pt/SiO 2/Si Substrate by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.l936 ◽

1997 ◽

Vol 36 (Part 2, No. 7B) ◽

pp. L936-L938

Author(s):

Jae-Whan Kim ◽

Hyun-Ho Kim ◽

Dang-Moon Wee ◽

Won-Jong Lee

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Perovskite Phase ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Si Substrate ◽

Resonance Plasma

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