In situ infrared spectroscopic study on the role of surface hydrides and fluorides in the silicon chemical vapor deposition process

1995 ◽  
Vol 13 (6) ◽  
pp. 2698-2702 ◽  
Author(s):  
Chan‐Hwa Chung ◽  
Sang Heup Moon ◽  
Shi‐Woo Rhee
2019 ◽  
Vol 9 (2) ◽  
pp. 119-126 ◽  
Author(s):  
Sivamaran Venkatesan ◽  
Balasubramanian Visvalingam ◽  
Gopalakrishnan Mannathusamy ◽  
Viswabaskaran Viswanathan ◽  
A. Gourav Rao

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