Thickness metrology and end point control in W chemical vapor deposition process from SiH[sub 4]/WF[sub 6] using in situ mass spectrometry

2002 ◽  
Vol 20 (6) ◽  
pp. 2351 ◽  
Author(s):  
Y. Xu ◽  
T. Gougousi ◽  
L. Henn-Lecordier ◽  
Y. Liu ◽  
S. Cho ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Chemical Vapor Deposition Process ◽  
End Point ◽  
Point Control ◽  
Vapor Deposition Process

scholarly journals In situ synthesis of multi-walled carbon nanorings by catalytic chemical vapor deposition process

2019 ◽  
Vol 9 (2) ◽  
pp. 119-126 ◽  
Author(s):  
Sivamaran Venkatesan ◽  
Balasubramanian Visvalingam ◽  
Gopalakrishnan Mannathusamy ◽  
Viswabaskaran Viswanathan ◽  
A. Gourav Rao
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
In Situ Synthesis ◽  
Chemical Vapor Deposition Process ◽  
Catalytic Chemical Vapor Deposition ◽  
Carbon Nanorings ◽  
Vapor Deposition Process
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