Deposition of silicon oxide films from TEOS by low frequency plasma chemical vapor deposition

1993 ◽  
Vol 11 (2) ◽  
pp. 400-405 ◽  
Author(s):  
G. Tochitani ◽  
M. Shimozuma ◽  
H. Tagashira
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Low Frequency ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Frequency Plasma

The Development of Polyethylene Naphthalate Films by Low-pressure High-frequency Plasma Chemical Vapor Deposition System with Advance Oxidations Process

2015 ◽  
Vol 18 (1) ◽  
Author(s):  
Nuttee Thungsuk ◽  
Toshifumi Yuji ◽  
Narong Mungkung ◽  
Yoshimi Okamura ◽  
Atsushi Fujimaru ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Frequency ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Polyethylene Naphthalate ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
High Frequency Plasma ◽  
Frequency Plasma

AbstractThe low-pressure high-frequency plasma chemical vapor deposition (CVD) system was developed with non-thermal plasma process to study the Polyethylene naphthalate (PEN) surface characteristics. Plasma surface treatment by oxygen can improve the adhesive properties. A mixture of Ar and O

High-Performance SiOF Film Fabricated Using a Dual-Frequency-Plasma Chemical Vapor Deposition system

2004 ◽  
Vol 43 (9A) ◽  
pp. 5984-5989 ◽  
Author(s):  
Takashi Yoda ◽  
Keiji Fujita ◽  
Hideshi Miyajima ◽  
Rempei Nakata ◽  
Yukio Nishiyama ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Performance ◽  
Chemical Vapor ◽  
Dual Frequency ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Frequency Plasma
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