scholarly journals Radio‐frequency plasma chemical vapor deposition growth of diamond

1989 ◽  
Vol 7 (3) ◽  
pp. 2325-2327 ◽  
Author(s):  
Duane E. Meyer ◽  
Rodney O. Dillon ◽  
John A. Woollam
Author(s):  
Nuttee Thungsuk ◽  
Toshifumi Yuji ◽  
Narong Mungkung ◽  
Yoshimi Okamura ◽  
Atsushi Fujimaru ◽  
...  

AbstractThe low-pressure high-frequency plasma chemical vapor deposition (CVD) system was developed with non-thermal plasma process to study the Polyethylene naphthalate (PEN) surface characteristics. Plasma surface treatment by oxygen can improve the adhesive properties. A mixture of Ar and O


Carbon ◽  
2004 ◽  
Vol 42 (14) ◽  
pp. 2867-2872 ◽  
Author(s):  
Jianjun Wang ◽  
Mingyao Zhu ◽  
Ron A. Outlaw ◽  
Xin Zhao ◽  
Dennis M. Manos ◽  
...  

2001 ◽  
Vol 50 (7) ◽  
pp. 1264
Author(s):  
CHEN XIAO-HUA ◽  
WU GUO-TAO ◽  
DENG FU-MING ◽  
WANG JIAN-XIONG ◽  
YANG HANG-SHENG ◽  
...  

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