Characterization of silicon dioxide films deposited at low pressure and temperature in a helicon diffusion reactor

1993 ◽  
Vol 11 (6) ◽  
pp. 2954-2963 ◽  
Author(s):  
C. Charles ◽  
G. Giroult‐Matlakowski ◽  
R. W. Boswell ◽  
A. Goullet ◽  
G. Turban ◽  
...  
Keyword(s):  
Silicon Dioxide ◽  
Low Pressure ◽  
Silicon Dioxide Films

Characterization of Tunneling Current through Ultrathin Silicon Dioxide Films by Different-Metal Gates Method

2008 ◽  
Vol 47 (11) ◽  
pp. 8317-8320
Author(s):  
Takaaki Hirokane ◽  
Naoto Yoshii ◽  
Tatsuya Okazaki ◽  
Shinichi Urabe ◽  
Kazuo Nishimura ◽  
...  
Keyword(s):  
Silicon Dioxide ◽  
Tunneling Current ◽  
Metal Gates ◽  
Silicon Dioxide Films

Characterization of Thermally Annealed Fluorinated Silicon Dioxide Films Prepared by Liquid-Phase Deposition

2005 ◽  
Vol 44 (No. 6) ◽  
pp. L220-L223 ◽  
Author(s):  
Ming-Kwei Lee ◽  
Chung-Min Shih ◽  
Shu-Ming Chang ◽  
Hong-Chi Wang ◽  
Jung-Jie Huang
Keyword(s):  
Liquid Phase ◽  
Silicon Dioxide ◽  
Liquid Phase Deposition ◽  
Silicon Dioxide Films
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