The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2
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Published By Springer US

9781489915900, 9781489915887

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Modeling Process-Dependent Thermal Silicon Dioxide (SiO2) Films on Silicon

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2 ◽

10.1007/978-1-4899-1588-7_5 ◽

1993 ◽

pp. 31-41 ◽

Cited By ~ 1

Author(s):

H. F. Wei ◽

A. K. Henning ◽

J. Slinkman ◽

J. L. Rogers

Keyword(s):

Silicon Dioxide ◽

Sio2 Films ◽

Modeling Process

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Constant Current Stress Breakdown in Ultrathin SiO2 Films

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2 ◽

10.1007/978-1-4899-1588-7_49 ◽

1993 ◽

pp. 447-454

Author(s):

Pushkar P. Apte ◽

Taishi Kubota ◽

Krishna C. Saraswat

Keyword(s):

Constant Current ◽

Current Stress ◽

Sio2 Films

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Optically Induced Nitrogen Dangling Bonds in Amorphous Hydrogenated Silicon Nitride Thin Films

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2 ◽

10.1007/978-1-4899-1588-7_46 ◽

1993 ◽

pp. 421-426

Author(s):

W. L. Warren ◽

J. Kanicki ◽

P. J. McWhorter ◽

E. H. Poindexter

Keyword(s):

Thin Films ◽

Silicon Nitride ◽

Dangling Bonds ◽

Hydrogenated Silicon ◽

Amorphous Hydrogenated Silicon ◽

Optically Induced

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Single Electron Transfer from the Channel of a Sub-μm Mosfet to an Individual Interface Trap

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2 ◽

10.1007/978-1-4899-1588-7_42 ◽

1993 ◽

pp. 383-392 ◽

Cited By ~ 4

Author(s):

M. Schulz ◽

A. Pappas ◽

J. Vennemann

Keyword(s):

Electron Transfer ◽

Single Electron ◽

Interface Trap ◽

Single Electron Transfer

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Oxidation of Silicon in Oxygen: Measurement of Film Thickness and Kinetics

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2 ◽

10.1007/978-1-4899-1588-7_4 ◽

1993 ◽

pp. 23-30 ◽

Cited By ~ 1

Author(s):

S. C. Kao ◽

R. H. Doremus

Keyword(s):

Film Thickness ◽

Oxygen Measurement

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Observation of Thin SiO2 Films Using IR-RAS

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2 ◽

10.1007/978-1-4899-1588-7_11 ◽

1993 ◽

pp. 91-98 ◽

Cited By ~ 2

Author(s):

Shuzo Fujimura ◽

Kenji Ishikawa ◽

Haruhisa Mori

Keyword(s):

Sio2 Films

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High Pressure Oxidation for Low Temperature Passivation of Si1-xGex Alloys

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2 ◽

10.1007/978-1-4899-1588-7_9 ◽

1993 ◽

pp. 71-79

Author(s):

C. Caragianis ◽

Y. Shigesato ◽

D. C. Paine

Keyword(s):

High Pressure ◽

Low Temperature ◽

Pressure Oxidation ◽

High Pressure Oxidation

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Low Temperature Synthesis and Characterization of Silicon Dioxide Films

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2 ◽

10.1007/978-1-4899-1588-7_18 ◽

1993 ◽

pp. 165-174 ◽

Cited By ~ 1

Author(s):

G. S. Chakravarthy ◽

R. A. Levy ◽

J. M. Grow ◽

W. M. Attia

Keyword(s):

Low Temperature ◽

Silicon Dioxide ◽

Synthesis And Characterization ◽

Low Temperature Synthesis ◽

Temperature Synthesis ◽

Silicon Dioxide Films

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Tem Investigations of the Oxidation Kinetics of Amorphous Silicon Films

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2 ◽

10.1007/978-1-4899-1588-7_13 ◽

1993 ◽

pp. 109-116

Author(s):

Manfred Reiche

Keyword(s):

Amorphous Silicon ◽

Oxidation Kinetics ◽

Silicon Films ◽

Kinetics Of

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Pre-Gate Oxide Si Surface Control

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2 ◽

10.1007/978-1-4899-1588-7_21 ◽

1993 ◽

pp. 199-206 ◽

Cited By ~ 1

Author(s):

Mizuho Morita ◽

Tadahiro Ohmi

Keyword(s):

Gate Oxide ◽

Surface Control

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The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By Springer US

Modeling Process-Dependent Thermal Silicon Dioxide (SiO2) Films on Silicon

Constant Current Stress Breakdown in Ultrathin SiO2 Films

Optically Induced Nitrogen Dangling Bonds in Amorphous Hydrogenated Silicon Nitride Thin Films

Single Electron Transfer from the Channel of a Sub-μm Mosfet to an Individual Interface Trap

Oxidation of Silicon in Oxygen: Measurement of Film Thickness and Kinetics

Observation of Thin SiO2 Films Using IR-RAS

High Pressure Oxidation for Low Temperature Passivation of Si1-xGex Alloys

Low Temperature Synthesis and Characterization of Silicon Dioxide Films

Tem Investigations of the Oxidation Kinetics of Amorphous Silicon Films

Pre-Gate Oxide Si Surface Control

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2
Latest Publications