Amorphous and polycrystalline silicon films deposited by electron cyclotron resonance reactive plasma deposition
1993 ◽
Vol 11
(4)
◽
pp. 1896-1900
◽
1998 ◽
Vol 16
(3)
◽
pp. 1912-1916
◽
1992 ◽
Vol 31
(Part 2, No. 10A)
◽
pp. L1392-L1395
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Keyword(s):
1998 ◽
Vol 16
(5)
◽
pp. 2751-2756
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2001 ◽
Vol 80
(11)
◽
pp. 2084-2092
◽
1986 ◽
Vol 4
(4)
◽
pp. 818
◽
1993 ◽
Vol 11
(4)
◽
pp. 1686-1691
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