Amorphous and polycrystalline silicon films deposited by electron cyclotron resonance reactive plasma deposition

1993 ◽  
Vol 11 (4) ◽  
pp. 1896-1900 ◽  
Author(s):  
R. D. Knox ◽  
V. Dalal ◽  
B. Moradi ◽  
G. Chumanov
1992 ◽  
Vol 31 (Part 2, No. 10A) ◽  
pp. L1392-L1395 ◽  
Author(s):  
Hiroaki Kakinuma ◽  
Mikio Mohri ◽  
Taiji Tsuruoka

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