SiO2 planarization technology with biasing and electron cyclotron resonance plasma deposition for submicron interconnections

Katsuyuki Machida

doi:10.1116/1.583518

SiO2 planarization technology with biasing and electron cyclotron resonance plasma deposition for submicron interconnections

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.583518 ◽

1986 ◽

Vol 4 (4) ◽

pp. 818 ◽

Cited By ~ 44

Author(s):

Katsuyuki Machida

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electron-Cyclotron-Resonance Plasma Deposition of Carbon onto Silicon

Springer Proceedings in Physics - Amorphous and Crystalline Silicon Carbide II ◽

10.1007/978-3-642-75048-9_12 ◽

1989 ◽

pp. 60-65

Author(s):

J. Pankove ◽

V. Hornback ◽

S. Sritharan ◽

J. Wilson ◽

S. Asher ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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An electron cyclotron resonance plasma deposition technique employing magnetron mode sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575588 ◽

1988 ◽

Vol 6 (4) ◽

pp. 2348-2352 ◽

Cited By ~ 38

Author(s):

Chiharu Takahashi ◽

Mikiho Kiuchi ◽

Toshiro Ono ◽

Seitaro Matsuo

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Deposition Technique ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electron cyclotron resonance plasma deposition and etching of silicon nitride on GaSb for optoelectronic applications

Materials Science and Engineering B ◽

10.1016/0921-5107(94)90085-x ◽

1994 ◽

Vol 28 (1-3) ◽

pp. 369-373

Author(s):

R. Bonnot ◽

A. Gouskov ◽

G. Bougnot

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Optoelectronic Applications ◽

Resonance Plasma

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Comment on “Search for carbon nitride CNx compounds with a high nitrogen content by electron cyclotron resonance plasma deposition”, Diamond relat. mater., 3 (1994) 264–269

Diamond and Related Materials ◽

10.1016/0925-9635(94)90134-1 ◽

1994 ◽

Vol 3 (10) ◽

pp. 1277-1278 ◽

Cited By ~ 2

Author(s):

K.J. Boyd ◽

D. Marton ◽

S.S. Todorov ◽

A.H. Al-Bayati ◽

J.W. Rabalais

Keyword(s):

Nitrogen Content ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

High Nitrogen Content ◽

High Nitrogen ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electron Cyclotron Resonance Plasma Deposition Technique Using Raw Material Supply by Sputtering

Japanese Journal of Applied Physics ◽

10.1143/jjap.23.l534 ◽

1984 ◽

Vol 23 (Part 2, No. 8) ◽

pp. L534-L536 ◽

Cited By ~ 95

Author(s):

Toshiro Ono ◽

Chiharu Takahashi ◽

Seitaro Matsuo

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Raw Material ◽

Deposition Technique ◽

Electron Cyclotron Resonance Plasma ◽

Material Supply ◽

Resonance Plasma

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Electron cyclotron resonance plasma deposition of SiNx for optical applications

Thin Solid Films ◽

10.1016/0040-6090(94)90434-0 ◽

1994 ◽

Vol 241 (1-2) ◽

pp. 247-250 ◽

Cited By ~ 15

Author(s):

Pavel V. Bulkin ◽

Pieter L. Swart ◽

Beatrys M. Lacquet

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Optical Applications ◽

Resonance Plasma

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Planarizing a-C:H and SiO/sub 2/ films prepared by bias electron cyclotron resonance plasma deposition

10.1109/vmic.1989.78007 ◽

2003 ◽

Author(s):

M.W. Horn ◽

S.W. Pang ◽

M. Rothschild

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Low temperature epitaxial silicon growth using electron cyclotron resonance plasma deposition

10.31274/rtd-180813-12652 ◽

1995 ◽

Author(s):

Scott Jeffrey DeBoer

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Epitaxial Silicon ◽

Electron Cyclotron Resonance Plasma ◽

Silicon Growth ◽

Resonance Plasma

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A Silicon Oxide Antireflective Layer For Optical Lithography Using Electron Cyclotron Resonance Plasma Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.35.2863 ◽

1996 ◽

Vol 35 (Part 1, No. 5A) ◽

pp. 2863-2869 ◽

Cited By ~ 8

Author(s):

Yoshiaki Mimura ◽

Mikiho Kiuchi ◽

Kazunori Anzai ◽

Katsuyuki Machida

Keyword(s):

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Optical Lithography ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Search for carbon nitride CNx compounds with a high nitrogen content by electron cyclotron resonance plasma deposition

Diamond and Related Materials ◽

10.1016/0925-9635(94)90090-6 ◽

1994 ◽

Vol 3 (3) ◽

pp. 264-269 ◽

Cited By ~ 61

Author(s):

M. Diani ◽

A. Mansour ◽

L. Kubler ◽

J.L. Bischoff ◽

D. Bolmont

Keyword(s):

Nitrogen Content ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

High Nitrogen Content ◽

High Nitrogen ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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