Characterization of a new reactor for remote plasma chemical vapor deposition

Alan D. Huelsman; R. Reif

doi:10.1116/1.575796

Characterization of a new reactor for remote plasma chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575796 ◽

1989 ◽

Vol 7 (4) ◽

pp. 2554-2561 ◽

Cited By ~ 5

Author(s):

Alan D. Huelsman ◽

R. Reif

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Electric Characterization of Carbon Nanotubes Grown at Low Temperature by Remote Plasma Chemical Vapor Deposition for LSI Interconnects

10.7567/ssdm.2009.e-8-2 ◽

2009 ◽

Author(s):

M. Iizuka ◽

D. Yokoyama ◽

K. Ishimaru ◽

I. Yuitho ◽

T. Takeuchi ◽

...

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Characterization of the process, chemical structure, and surface morphology of the films

Diamond and Related Materials ◽

10.1016/j.diamond.2005.11.011 ◽

2006 ◽

Vol 15 (9) ◽

pp. 1484-1491 ◽

Cited By ~ 11

Author(s):

I. Blaszczyk-Lezak ◽

A.M. Wrobel ◽

M.P.M. Kivitorma ◽

I.J. Vayrynen ◽

T. Aoki

Keyword(s):

Chemical Vapor Deposition ◽

Surface Morphology ◽

Vapor Deposition ◽

Chemical Structure ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Growth of microcrystal silicon by remote plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.104661 ◽

1991 ◽

Vol 58 (3) ◽

pp. 281-283 ◽

Cited By ~ 25

Author(s):

Sung Chul Kim ◽

Moon Hyun Jung ◽

Jin Jang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Remote plasma chemical vapor deposition silicon oxynitride thin films: Dielectric properties

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590013 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1087 ◽

Cited By ~ 3

Author(s):

M. Hernández Vélez

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Dielectric Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Oxynitride ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Oligomerization and Polymerization Steps in Remote Plasma Chemical Vapor Deposition of Silicon-Carbon and Silica Films from Organosilicon Sources.

Chemistry of Materials ◽

10.1021/cm012004o ◽

2001 ◽

Vol 13 (8) ◽

pp. 2742-2742 ◽

Cited By ~ 2

Author(s):

A. M. Wróbel ◽

A. Walkiewicz-Pietrzykowska ◽

Y. Hatanaka ◽

S. Wickramanayaka ◽

Y. Nakanishi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Silica Films ◽

Plasma Chemical Vapor Deposition ◽

Silicon Carbon

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Molybdenum contamination in low‐temperature epitaxial silicon films grown by remote plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.118090 ◽

1996 ◽

Vol 69 (1) ◽

pp. 109-111 ◽

Cited By ~ 3

Author(s):

R. Sharma ◽

J. Fretwell ◽

B. Doris ◽

S. Banerjee

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Epitaxial Silicon ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Remote plasma chemical vapor deposition for high-efficiency ultra-thin ∼25-microns crystalline Si solar cells

2012 IEEE 38th Photovoltaic Specialists Conference (PVSC) PART 2 ◽

10.1109/pvsc-vol2.2013.6656713 ◽

2013 ◽

Author(s):

D. Sarkar ◽

E. U. Onyegam ◽

S. Saha ◽

L. Mathew ◽

R. A. Rao ◽

...

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Efficiency ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Si Solar Cells

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Growth and characterization of diamond films on TiN/Si(100) by microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2008.10.018 ◽

2009 ◽

Vol 18 (2-3) ◽

pp. 124-127 ◽

Cited By ~ 2

Author(s):

Wei-Chun Chen ◽

Wei-Lin Wang ◽

Rajanish N. Tiwari ◽

Li Chang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Growth and Characterization of the Laterally Enlarged Single Crystal Diamond Grown by Microwave Plasma Chemical Vapor Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/35/7/078101 ◽

2018 ◽

Vol 35 (7) ◽

pp. 078101 ◽

Cited By ~ 1

Author(s):

Ze-Yang Ren ◽

Jin-Feng Zhang ◽

Jin-Cheng Zhang ◽

Sheng-Rui Xu ◽

Chun-Fu Zhang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Single Crystal ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Single Crystal Diamond

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Characterization of Epitaxial Si Films Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition Using Cylindrical Rotary Electrode

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.3592 ◽

2006 ◽

Vol 45 (4B) ◽

pp. 3592-3597 ◽

Cited By ~ 15

Author(s):

Kiyoshi Yasutake ◽

Hiromasa Ohmi ◽

Hiroaki Kakiuchi ◽

Takuya Wakamiya ◽

Heiji Watanabe

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Pressure Plasma ◽

Si Films

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