Transient fluorocarbon film thickness effects near the silicon dioxide/silicon interface in selective silicon dioxide reactive ion etching

Mark A. Jaso; Gottlieb S. Oehrlein

doi:10.1116/1.575712

Transient fluorocarbon film thickness effects near the silicon dioxide/silicon interface in selective silicon dioxide reactive ion etching

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575712 ◽

1988 ◽

Vol 6 (3) ◽

pp. 1397-1401 ◽

Cited By ~ 19

Author(s):

Mark A. Jaso ◽

Gottlieb S. Oehrlein

Keyword(s):

Film Thickness ◽

Silicon Dioxide ◽

Reactive Ion Etching ◽

Ion Etching ◽

Silicon Interface ◽

Fluorocarbon Film

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ChemInform Abstract: Investigation of Reactive-Ion-Etching-Related Fluorocarbon Film Deposition Onto Silicon and a New Method for Surface Residue Removal.

Chemischer Informationsdienst ◽

10.1002/chin.198639006 ◽

1986 ◽

Vol 17 (39) ◽

Author(s):

G. S. OEHRLEIN ◽

J. G. CLABES ◽

P. SPIRITO

Keyword(s):

Reactive Ion Etching ◽

Film Deposition ◽

New Method ◽

Surface Residue ◽

Ion Etching ◽

Residue Removal ◽

Fluorocarbon Film

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X-ray photoelectron spectroscopy analyses of silicon dioxide contact holes etched in a magnetically enhanced reactive ion etching reactor

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590008 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1051 ◽

Cited By ~ 16

Author(s):

P. Czuprynski

Keyword(s):

Silicon Dioxide ◽

Photoelectron Spectroscopy ◽

Reactive Ion Etching ◽

Ion Etching ◽

X Ray

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Investigation of Reactive‐Ion‐Etching‐Related Fluorocarbon Film Deposition onto Silicon and a New Method for Surface Residue Removal

Journal of The Electrochemical Society ◽

10.1149/1.2108695 ◽

1986 ◽

Vol 133 (5) ◽

pp. 1002-1008 ◽

Cited By ~ 32

Author(s):

G. S. Oehrlein ◽

J. G. Clabes ◽

P. Spirito

Keyword(s):

Reactive Ion Etching ◽

Film Deposition ◽

New Method ◽

Surface Residue ◽

Ion Etching ◽

Residue Removal ◽

Fluorocarbon Film

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Etch Selectivity of Silicon Dioxide over Titanium Silicide Using CF 4 / H 2 Reactive Ion Etching

Journal of The Electrochemical Society ◽

10.1149/1.2096554 ◽

1989 ◽

Vol 136 (12) ◽

pp. 3812-3815 ◽

Cited By ~ 3

Author(s):

Mark A. Jaso ◽

Steve W. Robey ◽

Gottlieb S. Oehrlein

Keyword(s):

Silicon Dioxide ◽

Reactive Ion Etching ◽

Titanium Silicide ◽

Ion Etching

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Selective Etching of Silicon Dioxide Using Reactive Ion Etching with CF 4 ‐ H 2

Journal of The Electrochemical Society ◽

10.1149/1.2129291 ◽

1979 ◽

Vol 126 (8) ◽

pp. 1419-1421 ◽

Cited By ~ 106

Author(s):

L. M. Ephrath

Keyword(s):

Silicon Dioxide ◽

Reactive Ion Etching ◽

Selective Etching ◽

Ion Etching

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Reactive Ion Etching Of Silicon Dioxide

10.1117/12.975614 ◽

1987 ◽

Author(s):

Peter C. Sukanek ◽

Glynis Sullivan

Keyword(s):

Silicon Dioxide ◽

Reactive Ion Etching ◽

Ion Etching

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Removal of surface contamination after reactive ion etching of silicon dioxide

Vacuum ◽

10.1016/0042-207x(94)90245-3 ◽

1994 ◽

Vol 45 (5) ◽

pp. 519-524 ◽

Cited By ~ 6

Author(s):

R Jackson ◽

AJ Pidduck ◽

MA Green

Keyword(s):

Silicon Dioxide ◽

Reactive Ion Etching ◽

Surface Contamination ◽

Ion Etching

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Analysis of surface damage induced in silicon substrates by reactive ion etching of silicon dioxide

Defect Recognition and Image Processing in Semiconductors 1997 ◽

10.1201/9781315140810-92 ◽

2017 ◽

pp. 449-452

Author(s):

F. Uchida ◽

Miyako Matsui ◽

Kiyomi Katsuyama ◽

Takafumi Tokunaga ◽

Masayuki Kojima

Keyword(s):

Silicon Dioxide ◽

Reactive Ion Etching ◽

Surface Damage ◽

Silicon Substrates ◽

Ion Etching

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The effect of cathode materials on reactive ion etching of silicon and silicon dioxide in a CF4 plasma

Journal of Electronic Materials ◽

10.1007/bf02655646 ◽

1978 ◽

Vol 7 (3) ◽

pp. 415-428 ◽

Cited By ~ 13

Author(s):

L. M. Ephrath

Keyword(s):

Silicon Dioxide ◽

Cathode Materials ◽

Reactive Ion Etching ◽

Ion Etching

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Observation of inverse reactive ion etching lag for silicon dioxide etching in inductively coupled plasmas

Applied Physics Letters ◽

10.1063/1.116772 ◽

1996 ◽

Vol 68 (1) ◽

pp. 10-12 ◽

Cited By ~ 41

Author(s):

M. F. Doemling ◽

N. R. Rueger ◽

G. S. Oehrlein

Keyword(s):

Silicon Dioxide ◽

Reactive Ion Etching ◽

Inductively Coupled Plasmas ◽

Ion Etching ◽

Inductively Coupled ◽

Coupled Plasmas

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