Microwave plasma stream transport system for low temperature plasma oxidation

1984 ◽  
Vol 2 (2) ◽  
pp. 496-499 ◽  
Author(s):  
Kiyoshi Miyake ◽  
Shin’ichiro Kimura ◽  
Terunori Warabisako ◽  
Hideo Sunami ◽  
Takashi Tokuyama
Keyword(s):  
Low Temperature ◽  
Transport System ◽  
Microwave Plasma ◽  
Plasma Stream ◽  
Plasma Oxidation ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Stream Transport

scholarly journals LOW TEMPERATURE PLASMA OXIDATION TREATMENT OF SEVERAL ORGANIC PIGMENTS

1986 ◽  
Vol 15 (5) ◽  
pp. 675-678 ◽  
Author(s):  
Tatuhiko Ihara ◽  
Seisirô Itô ◽  
Mitsuo Kiboku
Keyword(s):  
Low Temperature ◽  
Plasma Oxidation ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Oxidation Treatment ◽  
Organic Pigments

Effect of radical on defect and molecular structure of monolayer MoS2 by low temperature plasma treatment

2022 ◽  
Author(s):  
Shuya ASADA ◽  
Akihisa OGINO
Keyword(s):  
Molecular Structure ◽  
Low Temperature ◽  
Plasma Treatment ◽  
Photoelectron Spectroscopy ◽  
Microwave Plasma ◽  
Hydrogen Ions ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
X Ray ◽  
Ar Plasma

Abstract The aim of this study is to form the sulfur defects on monolayer molybdenum disulfide (MoS2) by low temperature microwave plasma treatment suppressing disturbance of molecular structure. CVD-grown and plasma treated multilayer MoS2 surface were analyzed to investigate the effects of H2 and Ar plasma treatment on sulfur defects and molecular structure. It was found that the disturbance of molecular structure was suppressed in the H2 plasma treatment compared to the Ar plasma treatment. Varying the incident ratio of hydrogen ions H+ and radicals H*, the influences of H2 plasma treatment with high and low H*/H+ ratio on monolayer MoS2 structure were discussed. As a result of X-ray photoelectron spectroscopy, Raman spectroscopy and photoluminescence analysis, sulfur defects increased with the increase in total amount of radical incident on MoS2. In addition, it is speculated that the etching with radical contributed to form sulfur defects suppressing the disturbance of molecular structure.

Low-temperature plasma oxidation of activated carbons

Carbon ◽  
2002 ◽  
Vol 40 (11) ◽  
pp. 2028-2030 ◽  
Author(s):  
L.I Schukin ◽  
M.V Kornievich ◽  
R.S Vartapetjan ◽  
S.I Beznisko
Keyword(s):  
Low Temperature ◽  
Activated Carbons ◽  
Plasma Oxidation ◽  
Low Temperature Plasma ◽  
Temperature Plasma

Production of very fine TiN-Mo composite powders in a low-temperature plasma stream

1983 ◽  
Vol 22 (11) ◽  
pp. 869-873
Author(s):  
T. V. Rezchikova ◽  
I. A. Domashnev ◽  
V. N. Troitskii ◽  
V. I. Torbov ◽  
Yu. M. Shul'ga
Keyword(s):  
Low Temperature ◽  
Plasma Stream ◽  
Low Temperature Plasma ◽  
Composite Powders ◽  
Temperature Plasma
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