Deposition rate dependence of the critical optimization temperature for thin film properties: Evidence for the disordered area reevaporation mechanism

1982 ◽  
Vol 21 (4) ◽  
pp. 972-979 ◽  
Author(s):  
P. S. Vincett
Keyword(s):  
Thin Film ◽  
Deposition Rate ◽  
Rate Dependence ◽  
Film Properties

scholarly journals Detection of nitroaromatic vapours with diketopyrrolopyrrole thin films: exploring the role of structural order and morphology on thin film properties and fluorescence quenching efficiency

2015 ◽  
Vol 51 (6) ◽  
pp. 1143-1146 ◽  
Author(s):  
Monika Warzecha ◽  
Jesus Calvo-Castro ◽  
Alan R. Kennedy ◽  
Alisdair N. Macpherson ◽  
Kenneth Shankland ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Fluorescence Quenching ◽  
Optical Detection ◽  
Film Properties ◽  
Structural Order ◽  
Quenching Efficiency ◽  
First Time

Sensitive optical detection of nitroaromatic vapours with diketopyrrolopyrrole thin films is reported for the first time.

Annealing in water vapor as a new method for improvement of silicon thin film properties

2006 ◽  
Vol 352 (9-20) ◽  
pp. 955-958 ◽  
Author(s):  
S. Honda ◽  
A. Fejfar ◽  
J. Kočka ◽  
T. Yamazaki ◽  
A. Ogane ◽  
...  
Keyword(s):  
Thin Film ◽  
Water Vapor ◽  
New Method ◽  
Silicon Thin Film ◽  
Film Properties

Deposition-rate dependence of orientation growth and crystallization of Ti thin films prepared by magnetron sputtering

2015 ◽  
Vol 574 ◽  
pp. 71-77 ◽  
Author(s):  
A.Y. Chen ◽  
Y. Bu ◽  
Y.T. Tang ◽  
Y. Wang ◽  
F. Liu ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Deposition Rate ◽  
Rate Dependence ◽  
Orientation Growth
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